Ultrasonic transducer preparation method, ultrasonic transducer and information acquisition element
A technology of ultrasonic transducers and electrodes, applied in piezoelectric devices/electrostrictive devices, electrical components, piezoelectric/electrostrictive/magnetostrictive devices, etc. Problems such as the influence of piezoelectric properties of electrical materials and the influence of piezoelectric materials of ultrasonic transducers, to achieve the effect of ensuring integrity and reducing interference factors
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Embodiment 1
[0053] In view of the deficiencies in the above technical solutions, Embodiment 1 of the present application provides a method for manufacturing an ultrasonic transducer, such as image 3 as shown, image 3 A schematic flow chart of an ultrasonic transducer manufacturing method provided in an embodiment of the present application, the ultrasonic transducer manufacturing method includes:
[0054] 301. Form a first electrode layer that has not been patterned on a carrier wafer.
[0055] like Figure 4 as shown, Figure 4 In the above, the direction from the carrier wafer 200 to the first electrode layer 2021 is taken as the upper direction, or the direction where the operating region is located may also be taken as the upper direction, of course, Figure 4 Just illustrative.
[0056] The carrier wafer is a structure used to carry the first electrode layer and subsequently formed on the first electrode layer. Optionally, the material constituting the carrier wafer (Carrier Wa...
Embodiment 2
[0095] Based on the ultrasonic transducer preparation method described in the first embodiment above, the second embodiment of the present application provides an ultrasonic transducer preparation method, and the ultrasonic transducer preparation method described in the second embodiment of the present application is described in the first embodiment On the basis of the above method, steps 306-312 are added. It should be noted that steps 306-312 are not all steps to be performed, but are optional steps on the basis of steps 301-305.
[0096] Optionally, as in Figure 13 As shown, in the method for manufacturing an ultrasonic transducer provided in Embodiment 2 of the present application, after steps 301-305, the method further includes step 306.
[0097] 306. Form a passivation protection layer on the second surface of the first electrode.
[0098] The second surface of the first electrode is the side of the first electrode away from the piezoelectric layer.
[0099] The val...
Embodiment 3
[0123] Based on the preparation method of the ultrasonic transducer described in the first embodiment above, combined with the preparation method of the ultrasonic transducer provided in the second embodiment of the present application, the third embodiment of the present application provides a preparation method of the ultrasonic transducer, and the third embodiment of the present application The described ultrasonic transducer preparation method is based on the method described in Example 1, and steps 313-320 are added. It should be noted that steps 313-320 are not all steps to be performed, and are all performed in steps 301-320. 305 based on optional steps.
[0124] Optionally, as in Figure 21 As shown, in the method for manufacturing an ultrasonic transducer provided in Embodiment 3 of the present application, after steps 301-305, the method further includes steps 313-316.
[0125] 313 . Form a fourth opening extending to the second electrode at a position where the pie...
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