Multi-group hot filament reaction equipment

Abstract

The invention discloses multi-group hot filament reaction equipment, and belongs to the technical field of hot filament vapor deposition. The multi-group hot filament reaction equipment includes a shell, a plurality of mobile platforms are arranged side by side along the length direction in the shell, and the mobile platforms are all arranged in the shell through a sliding mechanism. The mobile platforms are all fixedly provided with reaction chambers, and the reaction chambers are all internally provided with hot filament vapor deposition reaction assemblies; a heating device is fixedly arranged at the top in the shell, and a substrate tray is arranged at the bottom of the heating device, and the substrate tray is used for installing substrates. According to the the multi-group hot filament reaction equipment, different types of hot filaments can be placed in the multiple reaction chambers, and when different types of films need to be deposited, the problem of wasting time due to frequent replacement of hot filaments can be avoided; and the multiple reaction chambers can work at the same time to realize the simultaneous deposition of the same or different kinds of film materials on the same substrate, the reaction rate is greatly improved, the deposition area is enlarged, and operation is facilitated.

Description

technical field [0001] The invention relates to the technical field of hot wire vapor deposition, in particular to a multi-group hot wire reaction equipment. Background technique [0002] Chemical vapor deposition is a film-forming technique that uses gaseous substances to form a solid film on the surface of a substrate through a chemical reaction. It has the advantages of wide application range, changeable coating chemical composition, good coating performance, controllable coating density and purity, etc., and is an important coating technology. Hot wire chemical vapor deposition is a kind of chemical vapor deposition. Hot wire chemical vapor deposition is widely used in the field of thin film preparation because of its advantages such as easy control of process conditions and no ion bombardment in the deposition process. [0003] In the gas phase reaction process, since the core part of the gas phase reaction, the hot wire has different lifetimes in different gases, so i...

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Problems solved by technology

[0004] The purpose of the present invention is to provide a multi-group hot wire reaction equipment to solve the problem that in the traditional gas phase reaction process, in order to ensure the life of the hot wire, it is usually necessary to replace the hot wire frequently when depositing different thin film materials, and in a In the hot wire chemical vapor deposition reaction, it is still impossible to deposit different substances on a substrate at the same time

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