Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Light dual-waveband transparent armor and preparation method thereof

A dual-band, transparent technology, applied in the direction of armor, protective equipment, armor plate structure, etc., can solve the problems of large thickness, heavy weight, compressed internal operator space, etc., to expand the interior space and improve maneuverability.

Pending Publication Date: 2020-08-11
NO 33 RES INST OF CHINA ELECTRONICS TECHNOOGY GRP
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, while ensuring the situational awareness of the combat environment of armored vehicles, it is urgent to improve the anti-ballistic capability of the sighting and detection system. Armor impacted by rock fragments to improve the survivability of armored vehicles. The glass of the viewing window of existing armored vehicles has defects of large thickness and heavy quality, which cannot guarantee the technical performance and maneuverability of the vehicle, and compresses the working hours of internal operators. Space, and the light transmission effect is also poor

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light dual-waveband transparent armor and preparation method thereof
  • Light dual-waveband transparent armor and preparation method thereof
  • Light dual-waveband transparent armor and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0039] see Figure 1 to Figure 3 , the present invention provides a light-weight dual-band transparent armor, comprising a bullet-receiving surface 1, a buffer layer 2 and an anti-splash layer 3, the bullet-receiving surface 1 adopts magnesium-aluminum spinel ceramics as a base material, and the buffer layer 2 includes Two layers of borosilicate glass, the anti-splash layer 3 is made of polycarbonate-PC material, between the bombardment surface 1 and the buffe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the field of transparent armors, in particular to a light dual-waveband transparent armor and a preparation method thereof. The light dual-waveband transparent armor comprisesa bullet facing surface, a buffer layer and an anti-splashing layer, wherein the bullet facing surface adopts magnesia-alumina spinel ceramic as a base material, the buffer layer comprises two layersof borosilicate glass, the anti-splashing layer adopts a polycarbonate-PC material as a base material, the bullet facing surface and the buffer layer, the two layers of borosilicate glass and the buffer layer and the anti-splashing layer are connected through bonding materials respectively, the bonding materials between the bullet facing face and the buffer layer and between the two layers of borosilicate glass of the buffer layer are polyvinyl butyral-PVB, the bonding material between the buffer layer and the anti-splashing layer is polyurethane-PU, the bonding materials bond the base materials on the two sides through a vacuum thermal compounding process, the outer surface of the bullet facing face and the outer surface of the anti-splashing layer are plated with dual-waveband anti-reflection films respectively, and the dual-waveband anti-reflection films are formed by compounding TiO2 and SiO2 as a high-refractive-index material and a low-refractive-index material. The invention further provides a preparation method of the light dual-waveband transparent armor.

Description

technical field [0001] The invention relates to the field of transparent armor, in particular to a lightweight dual-band transparent armor and a preparation method thereof. Background technique [0002] In a complex combat environment, armored vehicles become the priority target of enemy firepower due to the operational importance of the sighting and detection system of armored vehicles and their large external dimensions. Therefore, while ensuring the situational awareness of the combat environment of armored vehicles, it is urgent to improve the anti-ballistic capability of the sighting and detection system. Armor impacted by rock fragments to improve the survivability of armored vehicles. The glass of the viewing window of existing armored vehicles has defects of large thickness and heavy quality, which cannot guarantee the technical performance and maneuverability of the vehicle, and compresses the working hours of internal operators. Space, and the light transmission e...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): F41H5/04B32B9/00B32B9/04B32B27/06B32B27/10B32B7/12B32B33/00B32B37/06B32B37/10B32B37/12C23C14/26C23C14/35C23C14/08C23C14/10
CPCB32B17/064F41H5/0407F41H5/0414B32B9/005B32B17/06B32B7/12B32B33/00B32B37/06B32B37/10B32B37/12C23C14/26C23C14/35C23C14/083C23C14/10B32B2255/10B32B2255/20B32B2255/28B32B2307/40B32B2307/536B32B2307/718B32B2571/02
Inventor 吴点宇王腾张贵恩孙继伟马志梅吕德涛许晓丽常志广马富花董建阳张明宇胡小红钱明灿
Owner NO 33 RES INST OF CHINA ELECTRONICS TECHNOOGY GRP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products