A mxene/c based 3 no 4 Photonic diode with material composite structure and its preparation method and application
A technology of C3N4 and composite structure, which is applied in optics, optical components, instruments, etc., can solve the problems of few reports on the application of spatial self-phase modulation, and achieve the effects of overcoming electromagnetic interference, enriching types, and reducing energy consumption
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Embodiment 1
[0039] Please refer to figure 2 , figure 2 The MXene / C-based 3 N 4 Photonic diode with material composite structure, including front Mxene layer and reverse C 3 N 4 layer, among them, the front Mxene layer and the reverse C 3 N 4 The layers are all set as light-transmitting layers. Front Mxene layer and reverse C 3 N 4 The layers are stacked together to form an MXene / C-based 3 N 4 A photonic diode with a material composite structure, MXene is a type of two-dimensional material with strong nonlinear response characteristics. It has excellent nonlinear response characteristics in the light transmission process with a wavelength of 532-671nm. Absorbent material C 3 N 4 Combining them together can break the time-reversal symmetry and realize the non-reciprocal propagation of light.
[0040] The MXene / C based 3 N 4 In the photonic diode with composite structure, the front Mxene layer is MXene / PMMA film, and the reverse C 3 N 4 Layer is C 3 N 4 / PMMA film, combi...
Embodiment 2
[0046] A specific embodiment of the invention also provides in embodiment 1 based on MXene / C 3 N 4 Preparation method of composite structured photonic diode. The specific preparation process is as follows: provide the front Mxene layer and the reverse C 3 N 4 layer, combine the front Mxene layer with the reverse C 3 N 4 The layers are stacked together to get an MXene / C-based 3 N 4 Photonic diodes in material composite structures. Among them, the front Mxene layer is MXene / PMMA film, and the reverse C 3 N 4 Layer is C 3 N 4 / PMMA film.
[0047] In a specific embodiment, MXene / PMMA film and C 3 N 4 The preparation process of / PMMA film comprises the following steps:
[0048] (1) Centrifuge the two-dimensional material and dry it in a vacuum drying oven, where the two-dimensional material is a two-dimensional Mxene material or a two-dimensional C 3 N 4 Material;
[0049] (2) Add chloroform (chloroform) to the dried two-dimensional material, and ultrasonically disp...
Embodiment 3
[0057] Please refer to Figure 4 , Figure 4 The MXene / C-based 3 N 4 Photonic diode with material composite structure, including front Mxene layer and reverse C 3 N 4 layer, among them, the front Mxene layer and the reverse C 3 N 4 The layers are all set as light-transmitting layers. Front Mxene layer and reverse C 3 N 4 The layers are stacked together to form an MXene / C-based 3 N 4 Photonic diodes in material composite structures. In this embodiment, the front Mxene layer includes a cuvette and the Mxene-ethanol dispersion contained in the cuvette, and the reverse side C 3 N 4 The layer includes the cuvette and the C contained in the cuvette 3 N 4 - Ethanol dispersion. The specific preparation process is as follows: first, Mxene-ethanol dispersion and C 3 N 4 -The ethanol dispersion is filled into two 5mm thick cuvettes respectively, and then the two cuvettes are placed close together to form a composite structure, that is, based on MXene / C 3 N 4 Photonic d...
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