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A sample shape measuring device and method

A topography measurement and sample technology, which is applied in the field of reflective sample topography measurement devices, can solve the problems of large nonlinear influence of measurement signals, grating marking period cannot be too small, and nonlinear influence is large, so as to reduce the fringe interval and improve the Measurement accuracy, the effect of improving signal contrast

Active Publication Date: 2022-02-25
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

In this technology, the measurement accuracy is improved by using a grating mark with a small period, but the measurement range is small. In order to cover the thickness tolerance range of the sample to be measured, the period of the grating mark should not be too small
In addition, because only low diffraction orders are used, the nonlinear influence of the measurement signal is relatively large, especially when the projection grating error and the aberration of the imaging optical system are seriously affected, the nonlinear influence is even greater

Method used

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  • A sample shape measuring device and method
  • A sample shape measuring device and method
  • A sample shape measuring device and method

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Embodiment Construction

[0037] In order to make the purpose, technical solutions and advantages of the present disclosure clearer, the present disclosure will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0038] figure 1 A schematic structural view of a sample shape measuring device provided by an embodiment of the present disclosure is schematically shown. refer to figure 1 , combined with Figure 2-Figure 3B , the sample shape measuring device in this embodiment will be described in detail.

[0039] refer to figure 1 , the sample profile measurement device includes sequentially arranged light source assembly 101, illumination assembly 102, projection grating assembly 103, aperture assembly 104, projection optical assembly 105, detection optical assembly 107, detection grating assembly 108, data The collection component 109 and the moving table 110 arranged on the optical path between the projection optical assemb...

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Abstract

The disclosure provides a sample shape measuring device and method. The device comprises: a light source assembly (101), an illumination assembly (102), a projection grating assembly (103), an aperture assembly (104), a projection optical assembly (105), a detection optical assembly (107) arranged in sequence, a detection The grating assembly (108), the data acquisition assembly (109), and the motion table (110) arranged on the optical path between the projection optical assembly (105) and the detection optical assembly (107), the sample to be measured (106) is placed on the motion table (110) on. The aperture assembly is used to filter out low diffraction order signals to measure the sample height, to ensure the measurement range, and to select high diffraction order signals to measure the sample height again according to the measurement results, so as to improve the measurement accuracy.

Description

technical field [0001] The disclosure relates to a reflective sample shape measuring device and method. Background technique [0002] In the fields of optical processing, optical inspection, electron beam imaging, and lithography, it is often necessary to precisely control the position information of the sample in the Z direction (height direction). In order to ensure that the sample is always in the ideal position, it is necessary to accurately measure the surface topography of the sample. When measuring the high-precision topography of the sample surface, scanning electron microscopes and atomic force microscopes have high measurement resolution, but their measurement speed is relatively slow, and they have strict requirements on the measurement environment, so they are not suitable for online measurement. The optical non-contact measurement method has become the main method of online measurement due to its fast measurement speed and high resolution. [0003] In the rela...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/25
CPCG01B11/2531
Inventor 李璟杨光华王丹丁敏侠张清洋朱世懂冯磊折昌美
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI