An infrared radiation humidifying device and its humidifying method

Abstract

The invention discloses an infrared radiation humidifying device and a humidifying method thereof, comprising an infrared wave device, an evaporation chamber, a liquid-phase water supply device and a carrier air channel. The main cavity is an evaporation chamber; the infrared wave device is composed of a helical shaped infrared generator and an infrared controller, which are used to provide infrared waves with a certain spectrum and power; the liquid phase water supply device is controlled by a liquid supply diaphragm valve, Composed of atomizing nozzles, the carrier flow path includes a dry gas supply flow path and a wet gas outlet flow path, and a temperature sensor and a liquid level sensor are installed inside the evaporation chamber to ensure the internal temperature of the evaporation chamber and control the internal residual liquid volume; The droplet removal device is used to filter and remove ungasified small droplets entrained in the wet gas; it uses infrared radiation to accelerate the evaporation of water mist, with adjustable humidification, small temperature difference between the inlet and outlet of the carrier gas, and the working condition does not affect the ambient temperature, etc. Advantages, high humidification efficiency, improve the high cleanliness of ambient gas.

Description

technical field [0001] The invention relates to a gas humidification equipment, in particular to a humidification device and a humidification method used in semiconductor industry production with high cleanliness ambient gas requirements. Background technique [0002] In many occasions in the semiconductor industry production, it is necessary to use high-clean gas, and the adjustment and control of the humidity of the gas is also one of the common gas treatment processes. For example, the applicant mentioned in the Chinese invention patent with application number 201711395951.3 that the immersion lithography machine supplies air with high relative humidity above the silicon wafer to weaken the evaporation of the immersion liquid on the silicon wafer and prevent the occurrence of out of shape. The existing traditional gas humidification technologies mainly include: ultrasonic atomization humidification, packed tower bubbling humidification and spray cooling humidification; a...

AI Technical Summary

Problems solved by technology

[0003] The present invention aims to solve the problems of low humidification efficiency, large influence by surrounding environment temperature, uncontrollable humidification or low control efficiency or narrow temperature application range and humidification humidity in existing humidifying devices used in the production of semiconductor industry with high cleanliness ambient gas requirements. An infrared radiation humidifying device and its humidifying method that can improve the humidification efficiency, be less affected by the ambient temperature, increase the temperature application range, and improve the high cleanliness of the ambient gas due to the uncontrollable current situation.

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