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Infrared radiation humidification device and method

A humidification device and infrared radiation technology, applied in heating methods, air humidification systems, exposure devices for photo-plate making process, etc., can solve the problems of uncontrollable humidification, narrow temperature application range, and low control efficiency

Active Publication Date: 2020-10-30
ZHEJIANG CHEER TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention aims to solve the problems of low humidification efficiency, large influence by surrounding environment temperature, uncontrollable humidification or low control efficiency or narrow temperature application range and humidification humidity in existing humidifying devices used in the production of semiconductor industry with high cleanliness ambient gas requirements. An infrared radiation humidifying device and its humidifying method that can improve the humidification efficiency, be less affected by the ambient temperature, increase the temperature application range, and improve the high cleanliness of the ambient gas due to the uncontrollable current situation.

Method used

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  • Infrared radiation humidification device and method
  • Infrared radiation humidification device and method

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Embodiment 1

[0031] figure 1In the shown embodiment, an infrared radiation humidifying device includes an evaporation chamber 2, a liquid-phase water supply device 30, a carrier flow channel and a controller 90, and the liquid-phase water supply device 30 includes a liquid supply control valve 31 and an atomizing The nozzle 32 also includes an infrared heater 50 and an infrared controller 60. The main cavity is an evaporation chamber processed from clean, heat-insulating, and high-temperature-resistant materials; the infrared controller 60 is used to provide the infrared heater 50 with infrared-generated external heating Controlled infrared waves, the infrared heater 50 is installed inside the evaporation chamber 20, and the infrared heater is used to provide infrared waves to vaporize the liquid phase water; the carrier flow channel includes a dry gas inlet 42 and a wet gas outlet 43, wherein the dry gas inlet 42 One end located inside the evaporation chamber 20 is installed with an air f...

Embodiment 2

[0033] figure 2 In the shown embodiment, the infrared heater 50 adopts an inverted conical helix shape with a large top and a small bottom. Of course, it can also be a conical helix shape with a small top and a large bottom, or a double-sided spiral with a small middle part and a large top and bottom ends. Cone helix shape. When adopting an inverted tapered helix shape with a large top and a small bottom, the first heating connection end 53 and the second heating connection end 54 of the infrared heater 50 are vertically arranged in parallel and drawn out from the lower bottom end of the entire infrared heater 50 external location (see figure 2 ), wherein the first heating connection end 53 extends upwards and runs through the helical-shaped inner bucket-shaped channel 51 formed by the entire infrared heater 50, and then starts from the upper end 52 of the first heating connection end 53 to perform upward, downward and small Helically extending to connect with the upper en...

Embodiment 3

[0035] image 3 In the shown embodiment, a relative humidity sensor 71 and an outlet three-way valve 72 are arranged on the body output flow, and both the relative humidity sensor 71 and the outlet three-way valve 72 are electrically connected to the controller; the relative humidity sensor 71 is used for monitoring gas The relative humidity of the gas on the output flow path, the outlet three-way valve 72 is used to adjust the output gas flow rate according to the temperature and humidity data information detected by the humidity sensor 71 . Part or all of the output gas is reintroduced into the dry gas inlet 42 through the inlet three-way valve 74 along the return flow path 73, so that the relative humidity of the gas is readjusted. Others are identical with embodiment 1 or embodiment 2.

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Abstract

The invention discloses an infrared radiation humidification device and method. The infrared radiation humidification device comprises an infrared wave device, an evaporation chamber, a liquid-phase water supply device and a carrier gas flow channel, wherein the evaporation chamber is a main chamber body; the infrared wave device comprises a spiral special-shaped infrared generator and an infraredcontroller and is used for providing infrared waves with certain spectrum and power; the liquid-phase water supply device comprises a liquid supply control diaphragm valve and atomizing nozzles, thecarrier gas flow channel comprises a dry gas supply flow channel and a wet gas outlet flow channel, and a temperature sensor and a liquid level sensor are arranged in the evaporation chamber and usedfor guaranteeing temperature in the evaporation chamber and controlling the amount of residual liquid in the evaporation chamber; and a liquid drop removing device is used for filtering and removing unvaporized small liquid drops mixed in wet gas. The infrared radiation humidification device adopts an infrared radiation mode to accelerate water spray evaporation and has the advantages that humidification amount is adjustable, temperature difference of carrier gas inlet and outlet is small, temperature of the surrounding environment is not affected by working conditions and the like, humidification efficiency is high, and cleanliness of environment gas is improved.

Description

technical field [0001] The invention relates to a gas humidification equipment, in particular to a humidification device and a humidification method used in semiconductor industry production with high cleanliness ambient gas requirements. Background technique [0002] In many occasions in the semiconductor industry production, it is necessary to use high-clean gas, and the adjustment and control of the humidity of the gas is also one of the common gas treatment processes. For example, the applicant mentioned in the Chinese invention patent with application number 201711395951.3 that the immersion lithography machine supplies air with high relative humidity above the silicon wafer to weaken the evaporation of the immersion liquid on the silicon wafer and prevent the occurrence of out of shape. The existing traditional gas humidification technologies mainly include: ultrasonic atomization humidification, packed tower bubbling humidification and spray cooling humidification; a...

Claims

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Application Information

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IPC IPC(8): F24F6/10F24F6/14F24F11/89F24F13/08G03F7/20F24F110/20
CPCF24F6/10F24F6/14F24F13/08F24F11/89F24F2110/20G03F7/2041G03F7/70341G03F7/70858
Inventor 不公告发明人
Owner ZHEJIANG CHEER TECH CO LTD
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