Feeding cylinder structure of photoresist to photoetching machine

A photoresist and feeding barrel technology, which is applied in the field of photolithography machines, can solve the problems of plastic barrel deformation, rubber barrel leakage, and high air pressure, and achieve the effect of avoiding deformation or damage.

Inactive Publication Date: 2020-11-20
杭州易正科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the prior art, the commonly used photoresist is provided by a rubber cartridge. The feeding method of the existing rubber cartridge is that a sealing cover is arranged on the top of the rubber cartridge, and an air inlet pipe and a delivery pipe are plugged and fixed on the air inlet pipe. The end of the tube is inserted into the upper end of the rubber tube, the lower end of the delivery tube is inserted into the lower end of the rubber tube, the air is fed into the rubber tube through the air inlet pipe,

Method used

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  • Feeding cylinder structure of photoresist to photoetching machine
  • Feeding cylinder structure of photoresist to photoetching machine
  • Feeding cylinder structure of photoresist to photoetching machine

Examples

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Example Embodiment

[0019] Example: see Figure 1 to 4 As shown, a photoresist supply barrel structure on a lithography machine includes a tray 1, on which is arranged a rubber container 6, the opposite sides of the tray 1 are formed with lugs 12, and the lugs 12 are fixed with vertical A straight connecting column 2, a vertical stud 21 is formed on the upper end surface of the connecting column 2, an annular protective cover 11 is formed on the upper end surface of the tray 1, and the rubber container 6 is inserted into the protective cover 11; The upper end of the plastic container 6 is inserted with a sealing cover 3, and the upper end of the sealing cover 3 is formed with a locking plate 31. Both ends of the locking plate 31 extend out of the plastic container 6 and are inserted into the stud 21. The stud 21 A nut 4 is screwed on, and the nut 4 is pressed against the locking plate 31; a delivery tube 5 is inserted and fixed on the sealing cover 3, and the lower end of the delivery tube 5 is in...

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Abstract

The invention discloses a feeding cylinder structure of photoresist to a photoetching machine. The feeding cylinder structure comprises a tray, wherein a photoresist containing cylinder is placed on the tray, lugs are formed at the two opposite sides of the tray, vertical connecting pillars are fixed to the lugs, vertical studs are formed on the upper end faces of the connecting pillars, an annular protection hood is formed on the upper end face of the tray, and the photoresist containing cylinder is inserted in the protection hood; a sealing cover is inserted in the upper end of the photoresist containing cylinder, a lock catch plate is formed on the upper end face of the sealing cover, the two ends of the lock catch plate stretch out of the photoresist containing cylinder and are inserted in and sleeve the studs, and nuts are in screw joint with the studs, and press and abut against the lock catch plate, a conveying pipe is inserted in and fixed to the sealing cover, and the lower end of the conveying pipe is inserted in the bottom of the photoresist containing cylinder.

Description

technical field [0001] The invention relates to the technical field of photolithography machines, and more specifically relates to a structure of a photoresist feeding cylinder on a photolithography machine. Background technique [0002] With the development of national economy and science and technology, liquid crystal displays are more and more widely used. Wherein, in the production process of the liquid crystal display, photoresist is usually required to complete the production, such as the production of the array substrate. Specifically, the photoresist is composed of photosensitive resin, etc., and can form a specific pattern on the array substrate after operations such as light irradiation, development, and exposure, thereby facilitating the production of the array substrate. In the prior art, the commonly used photoresist is provided by a rubber cartridge. The feeding method of the existing rubber cartridge is that a sealing cover is arranged on the top of the rubbe...

Claims

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Application Information

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IPC IPC(8): B65D51/16B65D53/02B65D25/02G03F7/20
CPCB65D25/02B65D51/1644B65D53/02G03F7/70733
Inventor 徐俊
Owner 杭州易正科技有限公司
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