Plasma enhanced chemical vapor deposition equipment
An enhanced chemical and vapor deposition technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of uneven plating, plating defects, and incompleteness of electroplating films, so as to avoid electroplating defects and improve The effect of production quality
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0023] The technical solutions of the present invention will be clearly and completely described below with reference to specific embodiments. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.
[0024] A plasma-enhanced chemical vapor deposition apparatus, such as Figure 1 to Figure 6 As shown, it includes a vacuuming mechanism 1, a reaction mechanism 2 and a transfer mechanism 3, the vacuuming mechanism 1 is communicated with the reaction mechanism 2, and the vacuuming mechanism 1 vacuumizes the interior of the reaction mechanism 2 to provide a vaccine bottle that satisfies the The reaction conditions of the coating, the transfer mechanism 3 sends the product to be processed into or out of the reac...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com