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Photoresistor multi-angle automatic detection production processing device

An automatic detection and photoresistor technology, applied in the direction of using electric radiation detectors for light metering, etc., can solve the problems of unusability and decreased detection efficiency, and achieve the effect of easy access and convenient movement.

Pending Publication Date: 2020-12-11
东莞市优伟机电科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the deficiencies of the prior art, the present invention provides a photosensitive resistor with multi-angle automatic detection production and processing device, which solves the resistance change in the absence of light and the same intensity of light proposed in the above background technology, so that according to the resistance change Changes to judge whether the photoresistor is qualified, and this detection method can only be applied to the detection of ordinary photoresistors, and some product equipment with high requirements on the characteristic curve of the light resistance value cannot be used, and the manual operation time of manual detection The longer it is, the detection efficiency will decrease, etc.

Method used

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  • Photoresistor multi-angle automatic detection production processing device

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Embodiment Construction

[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0030]In the description of the present invention, unless otherwise stated, the meaning of "plurality" is two or more; the terms "upper", "lower", "left", "right", "inner", "outer" , "front end", "rear end", "head", "tail", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than Indicates or implies that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and therefore should not be construed as limiting the ...

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Abstract

The invention discloses a photoresistor multi-angle automatic detection production processing device which comprises a case frame. A conveying belt is installed above an inner cavity of the case frame, a detection cover is installed above the surface of the case frame on the right side of the conveying belt, and a detection table is installed at the bottom of the inner cavity of the detection cover. A pin clamping plate is mounted on the surface of the detection table, and a flow guide rod is arranged at the bottom of the pin clamping plate. According to the invention, an illumination mechanism is vertically arranged in the inner groove of a supporting rod, and a supporting sliding block and a sliding groove are movably connected in a clamped manner, so that the illumination mechanism is convenient to move while being supported; and through the arrangement of a rack and a synchronous gear, the illumination mechanism can conveniently complete left-right movement through rotary meshing connection of the rack and the synchronous gear to detect different illumination intensities of different positions of a photoresistor, the situation that use requirements cannot be met due to single detection is avoided, and therefore the actual numerical value of the photoresistor can be obtained.

Description

technical field [0001] The invention relates to the technical field of photoresistors, in particular to an automatic detection, production and processing device with multi-angle photoresistors. Background technique [0002] Photoresistor is a special resistor made of semiconductor materials such as cadmium sulfide or cadmium selenide. Its working principle is based on the internal photoelectric effect. The stronger the light, the lower the resistance value. As the light intensity increases, the resistance value decreases rapidly , the light resistance value can be as small as 1KΩ or less. Photoresistors are very sensitive to light. When there is no light, they are in a high-resistance state, and dark resistance can generally reach 1.5MΩ. The special properties of photoresistors will be widely used with the development of science and technology. , photoresistors are generally used for light measurement, light control, and photoelectric conversion to convert light changes into...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J1/42
CPCG01J1/42
Inventor 李路云白云
Owner 东莞市优伟机电科技有限公司