Method and device for generating small adversarial patches
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- BEIJING REALAI TECH CO LTD
- Publication Date
- 2021-03-30
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Abstract
Description
technical field
[0001] The invention relates to the technical field of machine learning, in particular to a method and device for generating a small-scale confrontation patch. Background technique
[0002] An adversarial patch is an adversarial example used to attack a deep learning model in the physical world and make the model output wrong results. The anti-patch with a large area has a significant attack effect, but the anti-patch with a large area is easy to be identified, and it is difficult to break through the defense method based on feature detection. Therefore, reducing the area and reducing the recognition degree have become the development trend of anti-patch. However, shrinking the area of ββthe adversarial patch will sharply reduce the attack success rate.
[0003] At this stage, methods to improve the effect of anti-patch attacks can be found in some work on attacking deep learning models in the physical world based on anti-patch. These works include the phy...