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Imprinting composition and method of forming a patterned layer using the same

A technology for patterning layers and compositions, applied in the field of optical elements and etching masks, which can solve problems such as impact

Pending Publication Date: 2021-01-26
KONINKLJIJKE PHILIPS NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Also, the limiting microstructure of the patterned layer can be strongly influenced by the conditions during hardening
Controlling conditions to obtain patterned layers with sufficiently high density within relatively short imprint times remains a challenge

Method used

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  • Imprinting composition and method of forming a patterned layer using the same
  • Imprinting composition and method of forming a patterned layer using the same
  • Imprinting composition and method of forming a patterned layer using the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0128] Embodiment 1: the preparation of acidification sol

[0129] A solution of TMOS (7.941 g) and MTMS (7.107 g) in water (6.57 g) and acetic acid (0.06 g) was prepared keeping the temperature of the mixture at 20°C. Hydrolysis is then carried out at 20° C. for 30 to 120 minutes. After hydrolysis, water (10.33 g) and 1-propanol (100.56 g) were added to form an acidified sol.

Embodiment 2

[0130] Example 2: Preparation of acidified sol-gel embossing ink

[0131] An acidified sol-gel stamping ink was prepared by adding 1-propanol (84 g) and 1-butanol (16 g) to the acidified sol prepared in Example 1 (100 g). The stamp ink was allowed to equilibrate by storing the stamp ink between -30°C and -20°C for at least 20 hours. The pH of the embossing ink was 4.5 as measured by mixing a sample of the composition with an equal volume of deionized water and measuring the pH of the resulting mixture at normal temperature and pressure (i.e., 20°C and 1 atm) (NTP) to 5.5. The solids content was 2.5% by weight.

Embodiment 3 to 9

[0132] Examples 3 to 9: Preparation of acidified sol-gel embossing ink compositions comprising a base

[0133] APTES or TEA was added to the acidified sol-gel imprint inks prepared in Example 1 to prepare seven acidified sol-gel imprint ink compositions containing bases (Table II). The base is added in an amount of 0.1 to 1% by weight of the embossing ink composition. To compensate for the increase in pH by adding base, as measured by mixing a sample of the composition with an equal volume of deionized water and measuring the pH of the resulting mixture at normal temperature and pressure (i.e., 20°C and 1 atm) (NTP) The pH was adjusted to 4 to 6 using additional formic acid, as in .

[0134] The molar ratio of TEA to formic acid is 1:4. This ratio was found to be optimal as it allowed the pH to be adjusted from 4 to 6. The molar ratio of APTES to formic acid is 1:1 to 2:1, which allows the pH to be adjusted to 4.5 to 5.5.

[0135] The imprint ink of Example 2 and the impri...

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PUM

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Abstract

Disclosed is a sol-gel imprinting ink composition comprising a sol and an additive for promoting gelation of the composition during imprinting at an imprinting temperature. The composition has a pH of4-7 when mixed with an equal volume of deionized water and measured at 20 degC and 1 atm. The additive is the reversible reaction product of a protic acid and a proton-accepting base. The vapour pressure of the acid is higher than that of the base at the imprinting temperature such that the concentration of the base in the composition increases relative to the concentration of the acid in the composition during imprinting, resulting in basification of the composition. Further disclosed is a method of forming a patterned layer with such a sol-gel imprinting ink composition, and an optical element and an etch mask respectively including the patterned layer.

Description

technical field [0001] The present invention relates to an embossing composition. [0002] The invention further relates to methods of forming patterned layers using such imprinting compositions. [0003] The invention still further relates to an optical element and an etch mask respectively comprising such a patterned layer. Background technique [0004] Like other imprint lithography techniques, Substrate Conformal Imprint Lithography (SCIL) involves imprinting with a patterned stamp a layer that has been applied to the surface of a substrate. For example, the stamp may be made of silicone rubber such as polydimethylsiloxane (PDMS). This layer can be hardened or cured using the stamp during imprinting. When sufficient curing has occurred, the stamp is removed, leaving a patterned layer on the substrate. [0005] Various types of embossing inks can be used, such as UV curable compositions and sol-gel compositions. The suitability of a curable compound for use in an imp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G03F7/075B82Y10/00B82Y40/00
CPCG03F7/0002G03F7/0752B82Y10/00B82Y40/00G03F7/075G03F7/0392
Inventor M·A·维尔斯储雷恩
Owner KONINKLJIJKE PHILIPS NV