Automatic cleaning system of photoresist collecting device

Abstract

The invention discloses an automatic cleaning system of a photoresist collecting device, which comprises a cleaning liquid tank, a collecting device body, a liquid collecting box, a liquid guide pipe,a first pump body, ultrasonic cleaning devices, a filter screen, a circulating pipe, a PLC control system, a touch screen and a nozzle; the top end of the cleaning liquid tank is provided with a liquid inlet; the liquid guide pipe is arranged on the right side of the cleaning liquid tank; one end of the liquid guide pipe is communicated with the cleaning liquid tank; the first pump body is arranged at the other end of the liquid guide pipe; a conveying pipe is arranged at one end of the first pump body, penetrates through a collecting device shell and is arranged in the collecting device; a through pipe is arranged on the conveying pipe, and the nozzle is arranged at the bottom end of the through pipe; the ultrasonic cleaning devices are arranged on the two sides in the collecting device;a flow guide plate is arranged at the bottom end of the collecting device body; and the PLC control system can enable the whole cleaning system to perform programming control, so that the running time of each unit can be increased or decreased according to requirements, the cleaning sequence can be changed, and the operation is convenient.

Description

technical field [0001] The invention relates to the technical field of photoresist, in particular to an automatic cleaning system for a photoresist collecting device. Background technique [0002] Photolithography technology is a process technology that uses optical-chemical reaction principles and chemical and physical etching methods in integrated circuits to transfer circuit graphics to single crystal surfaces or dielectric layers to form effective graphics windows or functional graphics; with the development of semiconductor technology With the development, the size limit of photolithography technology transfer pattern has been reduced by 2 to 3 orders of magnitude (from millimeter level to sub-micron level), and it has become a kind of precise micro-mechanical technology. The single crystal surface or dielectric layer is glued to meet its precision requirements. [0003] For example, the publication number is "CN201921497382.8" and the patent name is: "a photoresist cl...

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Problems solved by technology

[0004] However, the existing photoresist collection device needs to be cleaned manually when cleaning the photoresist collection device, which is prone to problems such as incomplete cleaning, low efficiency, and affecting production capacity.

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