ANN-based optical characteristic modeling database generation method

Abstract

The invention provides an ANN-based optical characteristic modeling database generation method, which comprises the following steps of generating training data of an ANN, the training data at least comprising an optical characteristic parameter and a grating size parameter; training the grating size parameters based on an ANN training model so as to learn and obtain a mapping relationship between the optical characteristic parameters and the training labels of the grating size parameters; evaluating the quality of grating size parameter training in the step S2; and performing experimental verification on grating size parameters generated by the model obtained by training in the step S2 based on real optical characteristic parameters obtained by an optical measurement means; the accurate mapping relation between the optical characteristic parameters and the grating size parameters is obtained through repeated learning optimization in the step S3 and experimental verification in the step S4, so that an optical characteristic modeling database is established, and the defect that a relatively accurate database is difficult to establish efficiently in a time-saving mode through an existing optical characteristic modeling database generation method is overcome.

Description

technical field [0001] The invention belongs to the technical field of optical measurement, and in particular relates to an ANN-based optical characteristic modeling database generation method. Background technique [0002] In chip manufacturing, electronic components are gradually miniaturized, and the size of devices is reduced from micrometers, submicrometers to nanometers. At present, for the detection of the geometry of nanostructures, the main techniques used are optical measurement and electron beam measurement. Optical measurement has the advantage of fast measurement speed, but is limited by the diffraction limit, usually only micron and sub-micron processing defects can be measured; electron beam measurement can achieve nanoscale or even higher resolution, but the main disadvantage is that the measurement slower. In order to solve the problem that the measurement speed and measurement resolution cannot be satisfied at the same time, the optical critical dimension...

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Problems solved by technology

[0004] The object of the present invention is to aim at the deficiencies of the prior art, to provide a method for generating an optical characteristic modeling database based on ANN, which solves the disadvantage that the existing optical characteristic modeling database generation method is difficult to save time and efficiently establish a relatively accurate database

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