Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Composite preparation method of high-density coating

A coating and dense technology, applied in coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of substrate material damage, unrealistic, low preparation rate, etc.

Inactive Publication Date: 2021-04-30
LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the limitations of chemical vapor deposition technology, defects such as cracks and micropores will inevitably occur during the preparation of the coating.
When the coating is in use, these cracks and pores can form channels, causing the matrix material to be destroyed, thereby rendering the coating ineffective
Atomic layer deposition technology is a precise preparation technology that can prepare highly dense and nearly perfect defect-free coatings, but its preparation rate is very low, generally only about 0.1 μm / h, and the thickness of highly dense coatings is generally It is 100-200 μm, therefore, it is unrealistic to prepare high-density coatings by atomic layer deposition technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Composite preparation method of high-density coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] (1) Place the substrate in the reaction chamber and evacuate the reaction chamber to 1×10 -3 Pa;

[0022] (2) Heating the substrate to 700°C and maintaining it;

[0023] (3) Iridium (Ir) coatings were prepared using atomic layer deposition technology, and the two precursors were iridium acetylacetonate (Ir(acac) 3 ) and oxygen (O 2 ), the coating thickness is 0.1 μm;

[0024] (4) Utilize chemical vapor deposition technology to prepare iridium (Ir) coating, the preparation source gas is iridium acetylacetonate (Ir(acac) 3 ), the coating thickness is 2 μm;

[0025] (5) Alternately repeat the above steps (3) and (4), wherein step (3) is repeated 51 times, and step (4) is repeated 50 times.

Embodiment 2

[0027] (1) Place the substrate in the reaction chamber, and evacuate the reaction chamber to 2×10 -3 Pa;

[0028] (2) Heating the substrate to 600°C and maintaining it;

[0029] (3) Using atomic layer deposition technology to prepare hafnium oxide (HfO 2 ) coating, the two precursors are hafnium tert-butoxide (Hf(t-BuO) 4 ) and oxygen (O 2 ), the coating thickness is 0.05μm;

[0030] (4) Preparation of hafnium oxide (HfO 2 ) coating, the preparation source gas is hafnium tert-butoxide (Hf(t-BuO) 4 ) and oxygen (O 2 ), the coating thickness is 2 μm;

[0031] (5) Alternately repeat the above steps (3) and (4), wherein step (3) is repeated 51 times, and step (4) is repeated 50 times.

Embodiment 3

[0033] (1) Place the substrate in the reaction chamber, and evacuate the reaction chamber to 4×10 -3 Pa;

[0034] (2) Heating the substrate to 700°C and maintaining it;

[0035] (3) Iridium (Ir) coatings were prepared using atomic layer deposition technology, and the two precursors were iridium acetylacetonate (Ir(acac) 3 ) and hydrogen (H 2 ), the coating thickness is 0.1 μm;

[0036] (4) Utilize chemical vapor deposition technology to prepare iridium (Ir) coating, the preparation source gas is iridium acetylacetonate (Ir(acac) 3 ), the coating thickness is 2.5 μm;

[0037] (5) Alternately repeat the above steps (3) and (4), wherein step (3) is repeated 41 times, and step (4) is repeated 40 times.

[0038] The present invention combines the two technologies of atomic layer deposition and chemical vapor deposition, and uses the two technologies to alternately prepare the coating, and can utilize the high density of the atomic layer deposition coating to realize the elimin...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a composite preparation method of a high-density coating. The method adopts a manner of alternately preparing atomic layer deposition and chemical vapor deposition to finish the preparation of the high-density coating, and utilizes the high density of an atomic layer deposition coating to block defects such as cracks, micropores and the like in the chemical vapor deposition coating, heredity and development of various defects are prevented, so that the coating has the favorable barrier property, and meanwhile, the defect of low atomic layer deposition efficiency is overcome. The method can be used for preparing the coating with a high requirement on the compactness of the coating and larger thickness. The problem that a high-density coating prepared by purely adopting a chemical vapor deposition technology at present fails due to defects is solved.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a composite preparation method of a high-density coating. Background technique [0002] High-density coatings are widely used in various fields such as aerospace, aviation, and civil packaging. At present, the preparation of high-density coating mainly adopts chemical vapor deposition technology. However, due to the limitations of chemical vapor deposition technology, defects such as cracks and micropores will inevitably occur during the preparation of the coating. When the coating is in use, these cracks and pores can form channels, causing the matrix material to be destroyed and the coating to fail. Atomic layer deposition technology is a precise preparation technology that can prepare highly dense and nearly perfect defect-free coatings, but its preparation rate is very low, generally only about 0.1 μm / h, and the thickness of highly dense coatings is generally It is ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C16/455C23C16/40C23C16/18
CPCC23C16/45553C23C16/405C23C16/18
Inventor 熊玉卿周晖高恒蛟何延春曹生珠成功
Owner LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com