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Pattern etching method for double-glass photovoltaic module

A double-glass photovoltaic and component technology, which is applied in photovoltaic power generation, electrical components, semiconductor devices, etc., can solve problems such as expensive laser equipment, large-scale production limitations, and slow processing speed

Pending Publication Date: 2021-05-07
CNBM CHENGDU OPTOELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this method has certain limitations in large-scale production due to the expensive laser equipment and very slow processing speed.

Method used

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  • Pattern etching method for double-glass photovoltaic module
  • Pattern etching method for double-glass photovoltaic module
  • Pattern etching method for double-glass photovoltaic module

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Embodiment Construction

[0025] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention.

[0026] An embodiment of the present invention provides a method for etching a pattern of a double-glass photovoltaic module, such as figure 1 , 2 , 3 and 4, including:

[0027] S101, coating the glass substrate 1 of the double-glass photovoltaic module and forming a coating surface;

[0028] Here, the double-glass photovoltaic module includes a glass substrate 1 and a coating surface arranged in sequence from bottom to top, and the coating surface includes a TCO film layer 5, a CdTe power generation layer 3, a CdS power generation layer 4, and a Mo film layer 2 from bottom to top, During implementation, the glass substrate 1 of the double-glass photovoltaic module needs to be cleaned, coated and connected in series. Specifically, for the glass substrate 1 with a TCO (transpa...

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Abstract

The embodiment of the invention discloses a pattern etching method for a double-glass photovoltaic module. The method comprises the following steps of: applying a film onto a glass substrate of the double-glass photovoltaic module and forming a film-coated surface; arranging a mask layer with a preset hollow pattern on the film-coated surface; taking the mask layer as a shielding body, and performing etching treatment on the film-coated surface; and taking down the mask layer, and cleaning the glass substrate. The method of the embodiment of the invention has the advantages of easiness in batch production, simple manufacturing equipment, and higher processing speed.

Description

technical field [0001] The invention relates to a method for pattern etching, in particular to a method for pattern etching of a double-glass photovoltaic module. Background technique [0002] Double-glass modules have become mainstream photovoltaic products. The rise of BIPV puts forward more requirements for building material properties, especially appearance. In order to meet this requirement, the double-glass photovoltaic modules have produced a variety of colorful products by using methods such as colored film and patterned film. For thin-film components, laser or ultra-thin absorbing layer technologies are used to prepare light-transmitting products. [0003] For double-glass photovoltaic products with a top-lined structure, since the substrate is the sunny side, it is difficult to optimize the color appearance and pattern the appearance, so the appearance of the product has always been relatively simple. If the glass surface coating technology is used, the coating ...

Claims

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Application Information

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IPC IPC(8): H01L31/18H01L31/048
CPCH01L31/1828H01L31/0488Y02P70/50Y02E10/543
Inventor 彭寿潘锦功傅干华蒋猛刘鑫
Owner CNBM CHENGDU OPTOELECTRONICS MATERIAL
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