Photoelectric equipment defense planning method and device, equipment and storage medium

An optoelectronic and planning technology, applied in the field of equipment and storage media, optoelectronic equipment defense planning methods, and devices, can solve problems such as lack of persuasion, and achieve the effects of accurate realistic prediction, timeliness and complexity.

Active Publication Date: 2021-05-14
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF7 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method solves the problem of multiple threats to multiple defensive equipment to a certain extent, but expressing the status of incoming threats and the status of defensive equipment step by step is somewhat different from the actual threat that changes asynchronously over time, so this method is convincing. lacking

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photoelectric equipment defense planning method and device, equipment and storage medium
  • Photoelectric equipment defense planning method and device, equipment and storage medium
  • Photoelectric equipment defense planning method and device, equipment and storage medium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0045] The invention provides a defense planning method for optoelectronic equipment, such as figure 1 shown, including the following steps:

[0046] S101. Using existing ballistic data to train a BP neural network to obtain a ballistic model.

[0047]It should be noted that the BP neural network is trained by using the existing ballistic data, so that the BP neural network can predict the trajectory at any time according to the input initial position, veloci...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a photoelectric equipment defense planning method and device, equipment and a storage medium, and the method comprises the steps: training a BP neural network through employing the existing trajectory data, and obtaining a trajectory model; designing a defense model of the photoelectric defense equipment according to the characteristics of the photoelectric defense equipment; establishing a weapon target confrontation situation map by using the trajectory model and the photoelectric defense equipment defense model; predicting the weapon target confrontation situation map by using a Monte Carlo tree search algorithm and a deep learning neural network algorithm, and training a deep neural network; predicting the trajectory parameters of the incoming missile at any time according to the input attributes of the incoming missile through the trained BP neural network; and solving an optimal defense strategy through the trained deep neural network according to incoming missile trajectory parameters and photoelectric defense equipment parameters. Therefore, the timeliness and complexity of photoelectric defense are effectively dealt with, incoming attack threats can be automatically dealt with, human-in-the-loop is reduced, and the automatic control of the photoelectric defense system is enhanced.

Description

technical field [0001] The present invention relates to the field of equipment defense strategy, in particular to a method, device, equipment and storage medium for optoelectronic equipment defense planning. Background technique [0002] Equipment defense planning method is a planning method to realize automatic and semi-automatic defense of equipment. Due to the instantaneous nature of combat confrontation, fighters are often fleeting. Therefore, it is very meaningful to provide an automatic defense planning method. In equipment defense The policy domain has always been a hot topic of research. [0003] At present, the defense planning method of optoelectronic equipment is generally an optimization algorithm for the threat ranking of multiple threats to a single defensive equipment, using various attributes of incoming threats: speed, type, various attitude angles, attack targets, and distance from the target, etc. to sort threats , and then determine the interference sequ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/27G06N3/04G06N3/08F41H11/02
CPCG06F30/27G06N3/084F41H11/02G06N3/047G06N3/044Y02P90/30
Inventor 郭立红李姜刘畅李岩
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products