Alkali-free glass plate

Abstract

An alkali-free glass plate according to the present invention is characterized by: containing, as a glass composition, 60-74 mol% of SiO2, 6-20 mol% of Al2O3, 0-9 mol% of B2O3, 1-13 mol% of MgO, 1-13 mol% of CaO, 0-7 mol% of SrO, 0-8 mol% of BaO, and 0-1.0 (exclusive of 1.0) mol% of Y2O3+La2O3; containing substantially no alkali metal oxide; and having a strain point of 650 DEG C or higher.

Description

technical field [0001] The present invention relates to an alkali-free glass plate, and particularly relates to an alkali-free glass plate suitable as a substrate for forming a TFT circuit in a flat panel display such as a liquid crystal display or an organic EL display, or as a resin substrate for holding a TFT circuit. carrier glass. Background technique [0002] As is well known, a liquid crystal panel or an organic EL panel includes thin film transistors (TFTs) for drive control. [0003] Amorphous silicon, low-temperature polysilicon, high-temperature polysilicon, and the like are known as thin-film transistors for driving displays. In recent years, with the spread of large liquid crystal displays, smartphones, tablet PCs, and the like, there has been an increasing demand for higher resolution displays. Low-temperature polysilicon TFT can meet this demand, but after a high-temperature film-forming process of 500-600°C. However, the conventional glass plate suffers fr...

AI Technical Summary

Problems solved by technology

However, the conventional glass plate suffers from large thermal shrinkage before and after the high-temperature film formation process, which causes pattern shift of the thin film transistor

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