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Use method of photoresist material and detection system

A material and photoresist technology, applied in the direction of optics, photomechanical equipment, conveyor objects, etc., can solve the problems of photoresist material deterioration, poor machine process, error-prone, etc., to reduce man-hours, avoid manual errors, and save money. cost effect

Active Publication Date: 2021-06-15
HKC CORP LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] At present, the process of moving photoresist materials from the freezer to the machine mainly depends on manual judgment and directing the transport equipment to move to the machine. For example, the staff takes the photoresist materials out of the freezer and then uses transport tools such as cart Transport the photoresist material to the thawing room, and transport the thawed photoresist material to the machine. It can be frozen and thawed for repeated use without deterioration. However, after repeated repetitions, the photoresist material may deteriorate and deteriorate after use. The photoresist material will make the process of the machine poor, and it needs to be controlled manually, and it is easy to make mistakes through manual control

Method used

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  • Use method of photoresist material and detection system
  • Use method of photoresist material and detection system
  • Use method of photoresist material and detection system

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Embodiment Construction

[0059] It should be understood that the terminology and specific structural and functional details disclosed herein are representative only for describing specific embodiments, but the application can be embodied in many alternative forms and should not be construed as merely Be limited by the examples set forth herein.

[0060] In the description of the present application, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating relative importance, or implicitly indicating the quantity of indicated technical features. Therefore, unless otherwise specified, the features defined as "first" and "second" may explicitly or implicitly include one or more of these features; "plurality" means two or more. The term "comprising" and any variations thereof mean non-exclusive inclusion, possible presence or addition of one or more other features, integers, steps, operations, units, components and / or combinations thereof.

[0061] Al...

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Abstract

The invention discloses a use method of a photoresist material and a detection system. The use method comprises the steps that: a freezing chamber receives the photoresist material, and the photoresist material enters a freezing state; when a photoresist material unfreezing instruction is received, the photoresist material is sent out of the freezing chamber and sent into an unfreezing chamber, and the photoresist material enters an unfreezing state; when a machine-loading instruction is received, the photoresist material is sent out of the unfreezing chamber and sent to a machine table; when the machine table receives the photoresist material, the photoresist material is detected, and if the photoresist material is detected to be qualified, the photoresist material is sent to the machine table, and the photoresist material enters a machine-laoding state; and when a preset condition is monitored, the material information of the photoresist material is detected, and the photoresist material is sent back to the unfreezing chamber or the processing chamber according to the material information. Through the automatic detection mode of the system, the situation of possible manual errors is avoided, the working hours are reduced, and the cost is saved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a method for using a photoresist material and a detection system. Background technique [0002] The photolithography process is a common process in the semiconductor manufacturing process. Photoresist (PR), also known as photoresist or photoresist, refers to an etch-resistant film material that changes its solubility through various light or radiation. It is a key material in the photolithography process and is mainly used in integrated circuits and display panels. [0003] At present, the process of moving photoresist materials from the freezer to the machine mainly depends on manual judgment and directing the transport equipment to move to the machine. For example, the staff takes the photoresist materials out of the freezer and then uses transport tools such as cart Transport the photoresist material to the thawing room, and transport the thawed photoresist materia...

Claims

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Application Information

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IPC IPC(8): G03F7/20B65G47/74
CPCG03F7/70975B65G47/74
Inventor 潘柏松袁海江
Owner HKC CORP LTD
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