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Turning method for sputtering surface of rotary target material

A sputtering surface and rotating target technology, applied in the target field, can solve the problem that the sputtering performance of the target needs to be further improved, and achieve the effects of excellent sputtering performance, improved surface effect, and no residual stress.

Pending Publication Date: 2021-06-22
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the invention is not applicable to rotating targets, and the sputtering performance of the targets still needs to be further improved

Method used

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  • Turning method for sputtering surface of rotary target material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] This embodiment provides a method for turning the sputtering surface of a rotating target, such as figure 1 As shown, first install one end of the rotating target 1 on the fixed bracket 3, and place the fixture thimble 4 on the other end of the rotating target 1; install the cutter 2, and keep the blade attached to the surface of the rotating target 1, The dotted line is the feed path of tool 2.

[0052] The turning method described in this embodiment includes rough turning, semi-finish turning, finish turning and polishing performed in sequence. The feed rate of the rough turning is 0.8mm, the spindle speed is 210rpm, and the feed rate is 0.25mm / min; the semi-finishing turning is divided into two steps, including the first semi-finishing turning and the second half-finishing in sequence. Finishing turning; the feed rate of the first semi-finishing turning is 0.4mm, the spindle speed is 340rpm, and the feed rate is 0.15mm / min; the feed rate of the second semi-finishing...

Embodiment 2

[0055] This embodiment provides a method for turning the sputtering surface of a rotating target, such as figure 1 As shown, first install one end of the rotating target 1 on the fixed bracket 3, and place the fixture thimble 4 on the other end of the rotating target 1; install the cutter 2, and keep the blade attached to the surface of the rotating target 1, The dotted line is the feed path of tool 2.

[0056] The turning method described in this embodiment includes rough turning, semi-finish turning, finish turning and polishing performed in sequence. The feed rate of the rough turning is 0.7mm, the spindle speed is 200rpm, and the feed rate is 0.25mm / min; the semi-finishing turning is divided into two steps, including the first semi-finishing turning and the second half-finishing in sequence. Finishing turning; the feed rate of the first semi-finishing turning is 0.35mm, the spindle speed is 300rpm, and the feed rate is 0.15mm / min; the feed rate of the second semi-finishin...

Embodiment 3

[0059] This embodiment provides a method for turning the sputtering surface of a rotating target, such as figure 1 As shown, first install one end of the rotating target 1 on the fixed bracket 3, and place the fixture thimble 4 on the other end of the rotating target 1; install the cutter 2, and keep the blade attached to the surface of the rotating target 1, The dotted line is the feed path of tool 2.

[0060] The turning method described in this embodiment includes rough turning, semi-finish turning, finish turning and polishing performed in sequence. The feed rate of the rough turning is 0.9mm, the spindle speed is 230rpm, and the feed rate is 0.25mm / min; the semi-finishing turning is divided into two steps, including the first semi-finishing turning and the second half-finishing in sequence. Finishing turning; the feed rate of the first semi-finishing turning is 0.45mm, the spindle speed is 370rpm, and the feed rate is 0.15mm / min; the feed rate of the second semi-finishin...

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Abstract

The invention provides a turning method for a sputtering surface of a rotary target material. The turning method comprises the steps of rough turning, semi-finish turning, finish turning and polishing which are carried out in sequence. The feed amount of the rough turning is 0.6-1 mm; the semi-finish turning comprises first semi-finish turning and second semi-finish turning which are carried out in sequence, the feed amount of the first semi-finish turning is 0.3-0.5 mm, and the feed amount of the second semi-finish turning is 0.1-0.3 mm; the feed amount of the finish turning is 0.08-0.12 mm; the polishing comprises abrasive paper polishing and scouring pad polishing which are carried out in sequence; and after polishing, the roughness Ra of the sputtering surface of the rotating target material is less than or equal to 10 microns. The turning method provided by the invention is particularly suitable for turning the sputtering surface of the rotating target material, an excellent target material surface effect is obtained, the sputtering performance of the target material is ensured, and the yield and the quality of a plated object are improved.

Description

technical field [0001] The invention belongs to the technical field of targets, and relates to a turning method of a target, in particular to a turning method of a sputtering surface of a rotating target. Background technique [0002] After the target is plastically processed, there are oxide layers, stress layers and deformed layers on the sputtering surface. If it is directly used in the sputtering process without turning, it will seriously affect the sputtering performance, such as sputtering discharge phenomenon, the surface of the plated object There are molten particles or impurities, which will cause a short circuit in the product wiring clock, reduce the product yield, increase the scrap rate, and the target cannot be used normally. [0003] The existing turning process has a large feed rate, which generates strong internal stress, and the subsequent stress cannot be effectively released, which eventually leads to deformation of the target. In addition, for the rota...

Claims

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Application Information

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IPC IPC(8): B23P15/00B23B1/00C23C14/34
CPCB23P15/00B23B1/00C23C14/3407
Inventor 姚力军边逸军潘杰王学泽李小萍
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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