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Method for designing mask pattern, method for designing photomask, and photomask

A mask pattern and design method technology, applied in the field of semiconductors, can solve problems such as uneven distribution of load effect structures, achieve the effects of improving uniformity, saving process area, and improving productivity

Inactive Publication Date: 2021-06-22
YANGTZE MEMORY TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The technical problem to be solved by the present invention is to provide a method for designing a mask pattern of a semiconductor device, which can improve the problem of uneven structure distribution caused by the load effect when etching to form a semiconductor device structure

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  • Method for designing mask pattern, method for designing photomask, and photomask
  • Method for designing mask pattern, method for designing photomask, and photomask
  • Method for designing mask pattern, method for designing photomask, and photomask

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Embodiment Construction

[0024] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] In the following description, many specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways than those described here, so the present invention is not limited by the specific embodiments disclosed below.

[0026] As indicated in this application, the terms "a", "an", "an" and / or "the" are not specific to the singular and may include the plural unless the context clearly indicates an exception. Generally speaking, the terms "comprising" and "comprising" only suggest the inclusion of clearly identified steps and elements, and these steps and elements do not constitute an exclusive list, and the method or device may also contain other steps or ...

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Abstract

The invention provides a method for designing a mask pattern of a semiconductor device. The method comprises the following steps of designing a mask pattern corresponding to a functional region of the semiconductor device; and forming a dummy mask pattern around the mask pattern corresponding to the functional area based on the pattern in the mask pattern corresponding to the functional area. According to the design method of the mask pattern of the semiconductor device, in the manufacturing process of the semiconductor device, the uniformity problem of a semiconductor structure caused by a load effect can be improved, meanwhile, the quality and performance of a product can be guaranteed, the process area can be saved, and the productivity can be improved.

Description

technical field [0001] The present invention mainly relates to semiconductor technology, in particular to a method for designing a mask pattern for making a semiconductor device, a method for designing a photomask, a photomask for a semiconductor device and a method for manufacturing the semiconductor device. Background technique [0002] In the manufacturing process of semiconductor devices, the design of the mask pattern (or mask) is closely related to the fabrication of the photomask and the final formed semiconductor structure. In some semiconductor devices, such as three-dimensional memory, the structure of the edge region of the device is likely to affect the structure and function of the device due to the influence of the loading effect. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a method for designing a mask pattern of a semiconductor device, which can improve the problem of non-uniform structure dis...

Claims

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Application Information

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IPC IPC(8): G03F1/00G03F1/70
CPCG03F1/00G03F1/70
Inventor 韩玉辉周文犀
Owner YANGTZE MEMORY TECH CO LTD
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