MOCVD reaction system
A reaction system and reaction chamber technology, which is applied in metal material coating process, coating, gaseous chemical plating, etc., can solve the problems of difficult control of superconducting film composition, uneven gas mixing, large reaction chamber, etc. , to improve uniformity and mixing efficiency, reduce heat loss, and reduce the effect of diffusion area
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[0033] In order to better understand the above-mentioned purpose, features and advantages of the present application, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that these examples are used to illustrate the present application and not limit the scope of the present application. The implementation conditions used in the examples can be further adjusted according to the conditions of specific manufacturers, and the implementation conditions not indicated are usually the conditions in routine experiments. In the following description, many specific details are set forth in order to fully understand the application, but the application can also be implemented in other ways different from those described here, therefore, the protection scope of the application is not limited by the specific details disclosed below. EXAMPLE LIMITATIONS.
[0034] In the description...
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