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Rigid photosensitive resin composition based on polyurethane acrylate and production method thereof

A polyurethane acrylate and photosensitive resin technology, which is applied in the field of rigid photosensitive resin compositions based on polyurethane acrylate, can solve problems such as poor mechanical properties, low precision of finished products, and hindering the development of photosensitive resins.

Pending Publication Date: 2021-07-27
ZHUHAI SUNLU IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in China, due to the toxicity and odor of most photosensitive resins, as well as the low precision and poor mechanical properties of the finished products, they are monopolized by foreign countries, which seriously hinders the development of photosensitive resins in my country.

Method used

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  • Rigid photosensitive resin composition based on polyurethane acrylate and production method thereof
  • Rigid photosensitive resin composition based on polyurethane acrylate and production method thereof
  • Rigid photosensitive resin composition based on polyurethane acrylate and production method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Under the condition of avoiding light, 300g of polyurethane acrylate prepolymer SL-01 (number average molecular weight 1000), 50g of 1,6-hexanediol diacrylate, 35g of hydroxyethyl methacrylate, 16g of Acryloylmorpholine, 8g of diphenyl-(2,4,6-trimethylbenzoyl)phosphine, 4g of hydroquinone, and 5g of defoamer were stirred evenly to obtain photosensitive resin A1.

Embodiment 2

[0028] Under the condition of lucifuge, with the polyurethane acrylate prepolymer SL-01 (number average molecular weight 1000) of 300g, the tripropylene glycol diacrylate of 50g, the hydroxyethyl methacrylate of 35g, the acryloyl morpholine of 16g, 8g of diphenyl-(2,4,6-trimethylbenzoyl)phosphine, 4g of hydroquinone, and 5g of defoamer were stirred evenly to obtain photosensitive resin A2.

Embodiment 3

[0030] Under the condition of lucifuge, the urethane acrylate prepolymer SL-02 (number average molecular weight 1000) of 300g, the isobornyl methacrylate of 50g, the hydroxyethyl methacrylate of 35g, the acryloylmorpholine of 16g , 8g of diphenyl-(2,4,6-trimethylbenzoyl)phosphine, 4g of hydroquinone, and 5g of defoamer were stirred evenly to obtain photosensitive resin A3.

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PUM

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Abstract

The invention discloses a rigid photosensitive resin composition based on polyurethane acrylate and a production method thereof. The rigid photosensitive resin composition based on polyurethane acrylate comprises the following components in parts by weight: 10-75 parts of polyurethane acrylate; 10-25 parts of a difunctional alkene monomer; 10-20 parts of a monofunctional alkene monomer; 0.1-5 parts of a photoinitiator; 0.1-6 parts of a defoaming agent; and 0.1-5 parts of a stabilizer. The rigid photosensitive resin composition of the invention has the advantages of good rigidity, low cost and easy production.

Description

technical field [0001] The invention relates to the technical field of a rigid photosensitive resin composition based on polyurethane acrylate and a production method thereof. Background technique [0002] When photosensitive resin is exposed to light at a specific wavelength, the liquid will polymerize and then turn into a solid. In recent years, it has been widely used in industries such as medical treatment, animation figures, aviation, electrical appliances, and artwork. Especially due to the rapid development of desktop-level LCD printers, photosensitive resins play an important role in hand-made and jewelry models, and photo-curing technology is developing towards higher-precision micro-nano. [0003] By reacting urethane acrylate prepolymers without benzene rings and low-odor acrylate monomers to form polymers with high crosslink density, rigid photosensitive resins can be obtained. Therefore, photosensitive resins have great application prospects . [0004] However...

Claims

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Application Information

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IPC IPC(8): C08F283/00C08F222/14C08F220/20C08F220/18C08F222/20C08F220/58C08F2/48
CPCC08F283/008C08F2/48
Inventor 蒋昆
Owner ZHUHAI SUNLU IND
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