Intelligent evaporation coating method

Abstract

The invention discloses an intelligent evaporation coating method. The intelligent evaporation coating method mainly comprises the following steps: (1) starting a vacuum system of an intelligent evaporation coating machine to vacuumize a coating chamber; (2) starting an evaporation source and a central intelligent control module when the vacuum degree of the coating chamber meets the process requirement, and carrying out intelligent flexible closed-loop regulation and control on the boundary of the evaporation area of the evaporation source by the central intelligent control module; and (3) when a deposited film layer presents a required film thickness distribution state in a film coating breadth direction, starting a substrate conveying system to enable a substrate to continuously walk above the evaporation area, forming a film layer conforming to expected film thickness distribution on the substrate through the evaporation film coating process, and keeping the stability of the film thickness distribution state in the whole evaporation coating process. In the evaporation coating process of the step (3), the thickness of the film layer is controlled without adopting a means of arranging a correction baffle or a shielding plate.

Description

technical field [0001] The invention belongs to the technical field of vacuum coating, in particular to an intelligent evaporation coating method adopted in vacuum evaporation coating. Background technique [0002] In recent years, the rapid development of optical technology, energy storage technology, and flat panel display technology has put forward higher requirements for the uniformity and stability of thin film product performance. As one of the important process technologies for thin film preparation, vacuum evaporation coating has been widely used in the industrial production of thin film products in the above fields. Due to the influence of the cosine law of the evaporation source, if there is no interference, the distribution of the film layer deposited on the substrate during the vacuum evaporation process will show an uneven state. [0003] The vacuum evaporation coating method currently used in the coating industry generally uses a correction baffle to solve thi...

AI Technical Summary

Problems solved by technology

On the one hand, the use of the correction baffle is at the cost of sacrificing the efficiency of the coating film and the use efficiency of the film material; on the other hand, once the correction baffle is set, it will be relatively fixed during the coating process, and the evaporative substance will evaporate during the evaporation process. Evaporation characteristics change with different stages. In this case, even if a correction baffle is used, the film thickness distribution on the product will gradually change at different stages of long-term coating, which obviously cannot satisfy Optics, energy storage, and flat panel display, etc., have strict requirements on product performance

In addition, behind the rational setting of the correction baffle, a large amount of empirical data is often required as support, which is not conducive to the original product development and development of emerging film industries.

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