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Ceramic substrate, electrostatic chuck and manufacturing method of electrostatic chuck

An electrostatic chuck, ceramic substrate technology, applied in the application of electrostatic attraction holding devices, manufacturing tools, semiconductor/solid-state device manufacturing, etc., can solve the problem of inability to obtain bonding strength

Pending Publication Date: 2021-08-13
SHINKO ELECTRIC IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since there is no sintering agent that becomes a liquid phase during firing, joint strength with tungsten as a conductor cannot be obtained

Method used

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  • Ceramic substrate, electrostatic chuck and manufacturing method of electrostatic chuck
  • Ceramic substrate, electrostatic chuck and manufacturing method of electrostatic chuck
  • Ceramic substrate, electrostatic chuck and manufacturing method of electrostatic chuck

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0051] Reference now Figure 1 to 20 The first embodiment is described.

[0052] figure 1 It is a schematic cross-sectional view of the electrostatic suction cup of the first embodiment.

[0053] like figure 1 As shown, the electrostatic suction cup 1 includes a bottom plate 10 and a mounting table 20 disposed on the bottom plate 10. The mounting table 20 is fixed to the upper surface of the bottom plate 10 by a binder such as a silicone resin. Note that the mounting table 20 can also be secured to the bottom plate 10 by screws. The substrate W is placed on the upper surface of the mounting table 20. The substrate W is, for example, a semiconductor wafer or the like. The electrostatic suction cup 1 is configured to adsorb and hold the substrate W placed on the mounting table 20.

[0054] like figure 2 As shown, when viewed from above, the bottom plate 10 and the mounting table 20 have a circular shape. That is, the bottom plate 10 and the mounting table 20 have a disk shape. like ...

no. 2 example

[0114] Below, referring to Figure 21 and Figure 22 A second embodiment is described. Figure 21 It is a schematic cross-sectional view of the semiconductor package of the second embodiment, and Figure 22 It is a schematic plan view of a semiconductor package.

[0115] like Figure 21 As shown, the package 100 for the semiconductor device includes a ceramic substrate 110, a heat sink 150, and an outer connection terminal 160, and the heat sink 150 is welded to the ceramic substrate 110.

[0116] The ceramic substrate 110 includes a plurality of ceramic substrates 111, 112, 113, and 114, which are laminated (four in the present embodiment); the wiring patterns 121, 122, 123, 124, composed of tungsten; and through the ceramic substrate 112 The conductive holes 132, 133, 134 of 113, 114 are 113, 114. The conductive holes 132 interconnect the wiring patterns 121 and 122, and the conductive holes 133 interconnect the wiring patterns 122 and 123, and the conductive holes 134 interconnect t...

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Abstract

The invention relates to a ceramic substrate, an electrostatic chuck and a manufacturing method of the electrostatic chuck. The ceramic substrate includes a substrate main body, and a conductor layer provided inside of the substrate main body. The substrate main body includes an insulator layer that is ceramics composed of aluminum oxide, and a composite oxide layer of aluminum and silicon, the composite oxide layer being formed between the insulator layer and the conductor layer.

Description

Technical field [0001] The present invention relates to a ceramic substrate, an electrostatic suction cup, and a method of manufacturing the electrostatic chuck. Background technique [0002] In the prior art, a semiconductor manufacturing apparatus for processing a substrate such as a semiconductor wafer includes an electrostatic suction cup configured to maintain a semiconductor wafer. The semiconductor manufacturing apparatus is, for example, a film forming apparatus such as a CVD device, a PVD device, and the like. The electrostatic suction cup includes a mounting table for a ceramic substrate and a conductor pattern disposed in the mounting station, and the electrostatic suction cup hold the substrate on the mounting table by using a conductor pattern as an electrostatic electrode. The conductor pattern is formed by coking a conductive paste including a high melting material such as tungsten, such as a ceramic substrate, for example, with reference pTL1 and PTL2. Note that t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B41/90H01L21/683
CPCC04B41/52C04B41/90C04B41/009H01L21/6833C04B35/10C04B41/5032C04B41/5133C04B41/4535C04B41/5031C04B41/5035C04B41/5027C04B41/0072H01L23/13H01L23/36H01L23/15H01L23/49822H01L21/67103C04B41/88C04B2237/343C04B2237/68C04B2237/122C04B41/4539C04B41/4572C04B41/4578H02N13/00B23Q3/15H01L21/68757C04B41/5025C04B41/51C04B2235/3418H01L21/4807C04B2235/32C04B41/87
Inventor 峰村知刚
Owner SHINKO ELECTRIC IND CO LTD