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Film quality detection method and device, electronic equipment and storage medium

A quality inspection and film technology, applied in the field of film quality control, can solve the problems of low film quality inspection accuracy, lack of quantitative indicators for evaluation standards, and complex inspection procedures.

Pending Publication Date: 2021-08-17
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of this, the purpose of the embodiment of the present application is to provide a film quality detection method, device, electronic equipment and storage medium to improve the low accuracy of film quality detection, complex detection process and lack of quantification of evaluation criteria existing in the prior art. index problem

Method used

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  • Film quality detection method and device, electronic equipment and storage medium
  • Film quality detection method and device, electronic equipment and storage medium
  • Film quality detection method and device, electronic equipment and storage medium

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Embodiment Construction

[0064] The technical solutions in the embodiments of the present application will be described below with reference to the drawings in the embodiments of the present application.

[0065] Please see figure 1 , figure 1 A schematic diagram of a film quality detection method provided in the embodiment of the present application, the method includes:

[0066] In step S11, according to the mathematical model of the thin film sample and the ellipsometric detection curve obtained by the thin film sample through ellipsometric detection, the ellipsometric simulation curve of the thin film sample is obtained by inversion.

[0067] Among them, the thin film sample can be an optical thin film, and the intrinsic refractive index dispersion expression of the thin film material can be used as the characteristic parameter, and the ellipsometric detection of the thin film sample is carried out by an ellipsometer, and the ellipsometric The detection curve is obtained by inverting the ellipso...

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Abstract

The invention provides a film quality detection method and device, electronic equipment and a storage medium, and relates to the field of film quality control. The film quality detection method comprises the following steps: according to a physical mathematical model of a film sample and an ellipsometry detection curve obtained by ellipsometry detection of the film sample, taking an intrinsic refractive index dispersion expression of a film material as a characteristic parameter, and performing inversion to generate an ellipsometry simulation curve of the film sample; calculating the fitting degree of the ellipsometry detection curve and the ellipsometry simulation curve; and when the fitting degree is close to or greater than a preset fitting degree threshold value, determining that the quality of the film sample reaches a preset standard. The problems that in the prior art, film quality detection precision is low, detection procedures are complex, and evaluation standards lack quantitative indexes can be solved.

Description

technical field [0001] The present application relates to the field of film quality control, in particular, to a film quality detection method, device, electronic equipment and storage medium. Background technique [0002] The quality of optical films depends on the deposition quality of high and low refractive index material films. The performance and quality of high and low refractive index material films are closely related to the deposition process parameters of the film, and are also closely related to the deposition and growth mode of the film. [0003] Thin film deposition growth methods are mainly divided into atomic layer deposition technology, chemical vapor deposition technology and physical vapor deposition technology, etc. Different thin film deposition methods have different corresponding process parameters. Thin film physical vapor deposition technology is widely used in the fields of materials, optoelectronics, semiconductors, biomedical research and applicat...

Claims

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Application Information

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IPC IPC(8): G01N21/21G06F17/11
CPCG01N21/211G06F17/11
Inventor 胡建平刘民才王震吴倩张飞卫耀伟王健
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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