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Method and system for multi-layer autofocus

An automatic focus and focal plane technology, applied in the field of image processing, can solve the problems of system judgment error, strong focus position, unable to focus on the target object, etc., to achieve the effect of accurate focus

Active Publication Date: 2022-06-28
BEIJING LUSTER LIGHTTECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the second method can achieve real-time and accurate imaging, its disadvantage is that the focus position requires strong reflected light, so that it can only focus on the surface of the cover glass or the position with a large difference in refractive index between the upper and lower layers. Target objects with multiple highly reflective planes often cause interference, which leads to wrong judgment of the system
Therefore, the second method cannot accurately focus on objects with multiple depth planes

Method used

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  • Method and system for multi-layer autofocus
  • Method and system for multi-layer autofocus

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Embodiment Construction

[0049] see figure 1 , figure 1 A multi-layer autofocus system is shown, the system includes: a light source 1, a collimating lens 2, a semicircular diaphragm 3, a half mirror 4, a microscope objective 5, an object stage 6, a focusing Lens 7 , area array detector 8 and data processing unit 9 .

[0050] The light source 1 adopts a laser light source, which is arranged above the collimating lens and is used for emitting a laser beam to the collimating lens 2 .

[0051] In one possible design, a laser light source with a wavelength of 850 nm is used, which belongs to the biological and eye-safe band.

[0052] The collimating lens 2 is used to expand the laser beam, so that the diameter of the laser beam is larger than the diameter of the microscope objective lens 5; the collimating lens 2 collimates the laser beam.

[0053] In a possible design, the collimating lens 2 expands the laser beam to a diameter of 16 mm, so that the diameter of the laser beam is larger than the diamet...

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Abstract

This application shows a method and system for multi-layer auto-focus. This application adds a semicircular aperture to the multi-layer auto-focus system, so that the light spots focused on the detector plane are distributed on the detector according to the different focus positions. The upper and lower sides, so that the focus position of the objective lens can be quickly judged. A multi-layer autofocus method shown in this application is applied to a multi-layer auto focus system. In the multi-layer auto focus method shown in this application, a The evaluation function related to the spot intensity and size diameter can accurately judge the moving direction, determine the moving step size, and judge the focusing accuracy according to the spot. The technical solution shown in this application can perform real-time, fast and accurate focusing on a target object with multiple plane depths.

Description

technical field [0001] The invention belongs to the technical field of image processing, and in particular relates to a multi-layer automatic focusing method and system. Background technique [0002] Based on the development of image processing technology and digital imaging system, the development of microscopes has gradually moved towards serialization, integration and intelligence. Microscopes play an important role in various fields such as life science and material science. Autofocus technology is the core function of the microscope. Autofocus refers to the process of receiving the reflected light from the object through the photoelectric sensor, and controlling the motorized focusing device according to the calculation and processing inside the imaging device, so as to obtain a clear image on the image detector. [0003] The existing autofocus technology in microscopes is mainly divided into two categories. The first one is to obtain image information by photographing ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B21/24G02B21/00G02B21/08
CPCG02B21/244G02B21/006G02B21/08
Inventor 吴凡
Owner BEIJING LUSTER LIGHTTECH
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