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Double-resistance photoelectric protection film preparation method and double-resistance photoelectric protection film

A protective film, photoelectric technology

Pending Publication Date: 2021-09-07
芜湖夏鑫新型材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in the actual production process, due to untimely adjustment, or loosening of the scraper due to problems such as installation and use, it cannot be guaranteed that the scraper is always in the best scraping position, so that it cannot be guaranteed to scrape off the excess on the gluing roller in time. Glue will reduce the yield of double anti-photoelectric protective film

Method used

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Embodiment Construction

[0029] The specific embodiment of the present invention will be described in further detail by describing the embodiments below with reference to the accompanying drawings, the purpose is to help those skilled in the art to have a more complete, accurate and in-depth understanding of the concept and technical solutions of the present invention, and contribute to its implementation.

[0030] The invention provides a method for preparing a double anti-photoelectric protective film, comprising the following steps:

[0031] S1, unwinding;

[0032] S2, gluing;

[0033] S3, drying;

[0034] S4, winding.

[0035] Specifically, in the above step S1, the base film is unrolled by the unwinding drum, and the unrolled base film is transported to the coating machine by the guide roller. In the above step S2, the rotating glue roller 1 applies the glue solution to the surface of the base film. In the above step S3, the protective film coated with glue is transported to a drying box by ...

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Abstract

The invention discloses a double-resistance photoelectric protection film preparation method. The preparation method comprises the following steps of S1, unwinding; S2, gluing; S3, drying; and S4, rolling. In the step S2, the surface of a base film is coated with a glue solution through a glue spreader; and a scraper device is arranged on one side of the glue spreader and comprises a main scraper, a distance measuring element arranged on the main scraper and used for detecting the distance between the main scraper and the glue spreader, an auxiliary scraper located above the main scraper, and a scraper control mechanism used for controlling the auxiliary scraper to move between a glue scraping position and a non-glue scraping position. According to the double-resistance photoelectric protection film preparation method provided by the invention, the distance measuring element is arranged to be matched with the scraper control mechanism and the auxiliary scraper, so that the auxiliary scraper can be controlled to move to the glue scraping position in time when the main scraper is not located at the optimal glue scraping position, redundant glue on the glue spreader is scraped by the auxiliary scraper in time, and the yield of a double-resistance photoelectric protection film is increased. The invention also discloses the double-resistance photoelectric protection film.

Description

technical field [0001] The invention belongs to the technical field of protective film production. Specifically, the invention relates to a preparation method of a double anti-photoelectric protective film and a double anti-photoelectric protective film. Background technique [0002] The surface of the double-antistatic (double-sided antistatic) photoelectric protective film for glass sheets needs to be treated with glue, and a protective layer is formed on the front and back surfaces of the double-antistatic photoelectric protective film. The current double-anti-photoelectric protective film gluing process is to evenly coat the unrolled protective film on the surface of the protective film through the gluing roller, and set a scraper on one side of the gluing roller, and the scraper is used to scrape off the gluing The excess glue on the roller ensures the uniformity and consistency of glue application. After long-term use, the scraper will wear out, so the position of the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05D7/04B05D1/28B05C1/08C09J7/25
CPCB05D7/04B05D1/28B05C1/08B05C1/0817B05C1/0826B05C1/0895C09J7/255
Inventor 刘冬严卫国
Owner 芜湖夏鑫新型材料科技有限公司
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