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Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method

A technology for accelerometers and electronic systems, which is applied in the field of device manufacturing and can solve problems such as high noise of by-products

Pending Publication Date: 2021-09-07
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, while smaller accelerometers have the advantage of a larger useful frequency range, the by-product is significantly higher noise

Method used

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  • Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method
  • Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method
  • Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method

Examples

Experimental program
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Effect test

Embodiment Construction

[0053] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically depicted. The equipment includes:

[0054] - an illumination system (illuminator) IL configured for conditioning a radiation beam B (eg ultraviolet (UV) radiation or extreme ultraviolet (EUV) radiation).

[0055] - a support structure (eg mask table) MT configured to support the patterning device (eg mask) MA and connected to first positioning means PM configured to accurately position the patterning device according to specified parameters;

[0056] - a substrate table (e.g., wafer table) WTa or WTb configured to hold a substrate (e.g., a resist-coated wafer) W and configured to accurately position the substrate according to specified parameters the positioning device PW is connected; and

[0057] - a projection system (e.g. a refractive projection lens system) PS configured for projecting the pattern imparted to the radiation beam B by the patterning device MA onto a targ...

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PUM

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Abstract

The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: receive an acceleration signal from the piezoelectric element; electronically dampen an amplitude of the first mechanical resonance frequency; and generate a damped acceleration signal, b) an extender configured to: receive the damped acceleration signal; extend the frequency response; and output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European application 19155204.1 filed on February 4, 2019, the entire content of which is hereby incorporated by reference. technical field [0003] The present invention relates to an electronic system for an accelerometer, an accelerometer comprising such an electronic system, a method of calibrating the electronic system for the accelerometer, a lithographic apparatus, and a method of manufacturing a device using the lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually to a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. This patte...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01P15/09G01P21/00G03F7/20G01D3/032
CPCG03F7/709G01P15/09G01P21/00G03F7/70725G03F7/70775G01D3/032G03F7/7085G03F7/70516
Inventor H·巴特勒B·詹森C·A·L·德霍恩
Owner ASML NETHERLANDS BV