Semiconductor process execution method
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
- Publication Date
- 2021-09-10
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Abstract
Description
technical field
[0001] The present invention relates to the field of semiconductor technology, and in particular, to a method for executing a semiconductor technology. Background technique
[0002] The conventional process flow of crystalline silicon solar cell manufacturing mainly includes slicing, texturing, diffusion, etching, coating, silk screen printing, sintering, testing and sorting and other processes. In the production process of crystalline silicon solar cells, diffusion and coating processes are the key to improving the quality and efficiency of cells. Due to the continuous optimization of the process flow of the diffusion and coating process, it is necessary for the process equipment to continuously improve the process of editing and executing the process formula to meet the requirements of the production process. In the actual diffusion and coating production line, the process gas paths of different customer products have certain differences, and customers hav...