A gas-liquid cleaning device for quartz crystal oscillator high-frequency wafers
A technology of quartz crystal oscillator and cleaning device, which is applied in the direction of liquid cleaning method, dry gas arrangement, cleaning method and utensils, etc., can solve the problems of low cleaning efficiency and residual liquid left on the wafer, so as to improve efficiency, avoid waste, Avoid skin damage
Active Publication Date: 2022-08-02
深圳市科源信科技有限公司
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Problems solved by technology
[0005] The present invention mainly aims at the above problems, and proposes a gas-liquid cleaning device for quartz crystal oscillator high-frequency wafers, aiming to solve the problems of low cleaning efficiency and residual liquid left in the cleaned wafers in the prior art
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[0023] The present invention will be described in detail below with reference to the accompanying drawings, and the technical solutions in the embodiments of the present invention will be described clearly and completely. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0024] It should be noted that when a component is referred to as being "fixed to" another component, it can be directly on the other component or there may also be a centered component. When a component is considered to be "connected" to another component, it may be directly connected to the other component or there may be a co-existence of an intervening component. When a component is considered to be "set on" another co...
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The invention discloses a gas-liquid cleaning device for a quartz crystal oscillator high-frequency wafer, comprising a machine base, a station opening on the machine base, a cleaning bin on the working station opening, and a supporting column and a supporting column are arranged in the cleaning warehouse. There is a movably arranged positioning plate, a spring is arranged between the positioning plate and the cleaning chamber, a cover plate is arranged at the upper end of the station opening, and the cover plate is connected to the driving source. A cleaning hole runs through the tank, and a cleaning pipe and an air inlet communicating with the cleaning pipe are arranged on the positioning plate. An air outlet passing through the direction of the placement groove; wherein, under the action of the driving source, the cover plate cooperates with the positioning plate to form an independent space for the placement groove; the invention provides a gas-liquid cleaning device for a high-frequency wafer of a quartz crystal, The purpose is to solve the problems of low cleaning efficiency and residual liquid left in the cleaned wafer in the prior art.
Description
technical field [0001] The application belongs to the technical field of processing quartz crystal oscillator wafers, and in particular relates to a gas-liquid cleaning device for high-frequency quartz crystal oscillator wafers. Background technique [0002] It should be noted that the contents described in this section do not represent the prior art. [0003] Quartz crystal oscillator is a quartz crystal resonator made of quartz material, commonly known as crystal oscillator. It plays the role of generating frequency, has the characteristics of stability and good anti-interference performance, and is widely used in various electronic products. Quartz wafers need to go through multiple processing procedures in the production process, and the produced quartz wafers have a very important parameter index during the processing process, that is, the excitation power dependence, which specifically refers to the resonator under different excitation powers. The frequency and resis...
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IPC IPC(8): B08B3/12B08B13/00F26B21/00
CPCB08B3/12B08B13/00F26B21/004
Inventor 杨燕旋
Owner 深圳市科源信科技有限公司