Double-faced magnetron sputtering vacuum coating machine and vacuum coating method thereof
A vacuum coating machine and magnetron sputtering technology, which is applied in sputtering coating, vacuum evaporation coating, ion implantation coating, etc., can solve the problem of inability to achieve double-sided alternate and repeated coating, increase vacuuming time, and affect the quality of the film And other issues
Inactive Publication Date: 2021-10-15
江西鸿美新能源科技有限公司
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Problems solved by technology
That is to say, the double-sided coating of the film is completed twice, and the film needs to be moved out of the vacuum chamber during the process of completing the double-sided coating, so the film is easily polluted by the surrounding environment and affects the quality. On the other hand, the vacuuming time is increased while affecting efficiency
[0005] In addition, although there is also a vacuum coating machine that can realize double-sided coating of thin films at one time, it cannot realize the function of alternately repeating coating on both sides.
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[0026] In order to describe the technical content and structural features of the present invention in detail, further description will be given below in conjunction with the implementation and accompanying drawings.
[0027] see Figure 1 to Figure 4 The double-sided magnetron sputtering vacuum coating machine 100 of the present invention includes a vacuum chamber 10 having a vacuum chamber 11 and an unwinding mechanism 20, a winding mechanism 30, a first sputtering target unit 40a, and a vacuum chamber 11 arranged in the vacuum chamber 11. The second sputtering target unit 40b, the first cooling drum 50a, the second cooling drum 50b, the first ion source 50c and the second ion source 50d, so that the unwinding mechanism 20, the winding mechanism 30, Eight of the first sputtering target unit 40a, the second sputtering target unit 40b, the first cooling drum 50a, the second cooling drum 50b, the first ion source 50c and the second ion source 50d work under a vacuum environment....
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The invention provides a double-faced magnetron sputtering vacuum coating machine. The double-faced magnetron sputtering vacuum coating machine comprises a vacuum cavity with a vacuum cavity body, and an unwinding mechanism, a winding mechanism, first sputtering target units, second sputtering target units, first cooling drums, second cooling drums, a first ion source and a second ion source which are arranged in the vacuum cavity body. The number of the first cooling drums and the number of the second cooling drums are the same, the first cooling drums and the second cooling drums are alternately arranged at intervals, one corresponding first sputtering target unit is arranged beside each first cooling drum, and one corresponding second sputtering target unit is arranged beside each second cooling drum; a film between the unwinding mechanism and the winding mechanism bypasses the first cooling drums from gaps between the first cooling drums and the first sputtering target units and bypasses the second cooling drums from gaps between the second cooling drums and the second sputtering target units; and the first ion source and the second ion source are respectively positioned between the unwinding mechanism and the first cooling drum in the initial position, so that the aim of alternately and repeatedly coating two faces of the film is achieved. In addition, the invention further discloses a vacuum coating method.
Description
technical field [0001] The invention relates to the field of vacuum coating, in particular to a double-sided magnetron sputtering vacuum coating machine and a vacuum coating method capable of realizing double-sided alternate and repeated coating. Background technique [0002] Magnetron sputtering coating refers to a coating technology that uses the coating material as the target cathode, uses argon ions to bombard the target, produces cathode sputtering, and sputters the target atoms onto the workpiece to form a deposition layer. [0003] Among them, in the magnetron sputtering coating, the use of the magnetron sputtering vacuum coating machine is inseparable, so as to create a vacuum for the sputtering target unit set in the vacuum cavity by means of the vacuum chamber of the magnetron sputtering vacuum coating machine environment, ensuring the reliability of roll-shaped thin-film coatings. [0004] At present, in the existing magnetron sputtering vacuum coating machine, i...
Claims
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IPC IPC(8): C23C14/56C23C14/35C23C14/54
CPCC23C14/562C23C14/352C23C14/541
Inventor 李金明
Owner 江西鸿美新能源科技有限公司