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Glow discharge mass spectrometry high-purity gallium testing method

A technique of glow discharge mass spectrometry and testing methods, which is applied in the field of high-purity metal analysis and can solve problems such as unsuitable measurement and soft materials

Pending Publication Date: 2021-10-22
宣城开盛新能源科技有限公司 +1
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Problems solved by technology

[0004] In order to solve the above technical problems, a method for testing high-purity gallium by glow discharge mass spectrometry is provided. This technical method solves the problem that the materials are soft and unsuitable for measurement of metals with low melting points such as gallium and indium.

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Embodiment Construction

[0030] The following description serves to disclose the present invention to enable those skilled in the art to carry out the present invention. The preferred embodiments described below are only examples, and those skilled in the art can devise other obvious variations.

[0031] refer to Figure 1 to Figure 4 As shown, a method for testing high-purity gallium by glow discharge mass spectrometry, including:

[0032] Gain liquid gallium by heating solid gallium;

[0033] Clean the polytetrafluoroethylene mold, and after air drying, put the polytetrafluoroethylene mold on the cooling device;

[0034] Pour the liquid gallium into the polytetrafluoroethylene mold placed on the cooling device, and transfer it to the ultra-clean workbench within the set time, and let it stand until the formed sample is obtained;

[0035] Fix the formed sample and put it into the sample chamber of GDMS for vacuuming;

[0036] The sample is cooled by a semiconductor refrigeration method and discha...

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Abstract

One or more embodiments of the invention provide a glow discharge mass spectrometry high-purity gallium testing method, which comprises the following steps: heating solid gallium to obtain liquid gallium, cleaning a polytetrafluoroethylene mold, air-drying, putting the polytetrafluoroethylene mold on a cooling device, pouring the liquid gallium into the polytetrafluoroethylene mold placed on the cooling device, transferring the polytetrafluoroethylene mold into an ultra-clean bench within a set time, standing until a formed sample is obtained, fixing the formed sample, charging the sample into a GDMS sample chamber, vacuumizing, cooling the sample in a semiconductor refrigeration mode, discharging within the set time, and removing surface pollution through discharge sputtering; after the signal is stable, collecting and analyzing data are through the GDMS, and after the analysis is finished, recording and storing the data, so that the purpose that the plane to be measured can be obtained through a form conversion mode for low-melting-point metal such as gallium and indium for measurement is achieved.

Description

technical field [0001] The invention relates to the technical field of high-purity metal analysis, in particular to a method for testing high-purity gallium by glow discharge mass spectrometry. Background technique [0002] GDMS is a direct solid analysis technique, which has the advantages of high sensitivity, high resolution, small matrix effect, and full element analysis. It is the best method for the analysis of high-purity metal samples. At present, the purity of commercialized high-purity gallium can reach up to 7N, that is, the total content of all impurity elements is not higher than 0.1ppm, and germanium is the most important impurity element in high-purity gallium. [0003] The GDMS sample must be a solid sample, and the surface to be measured is a smooth plane. However, for metals with low melting points such as gallium and indium, the material is soft, and the surface to be measured cannot be obtained through processing for measurement. Contents of the inventio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/68G01N1/44G01N1/42G01N1/36
CPCG01N27/68G01N1/44G01N1/42G01N1/36Y02P10/20
Inventor 徐国军张蛟兰邦银蒋明伟杨谢行
Owner 宣城开盛新能源科技有限公司
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