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An Optical Plane Parallelism and Micro-displacement Measuring System

A measurement system and micro-displacement technology, applied in measurement devices, optical devices, instruments, etc., can solve the problems of difficult general jobs to fully implement and use, lack of accurate and easy-to-use parallelism measurement tools between planes, etc., and achieve a wide range of use. , high data accuracy, easy operation

Active Publication Date: 2021-12-17
SHENZHEN VINCENT TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, complex instruments and equipment have certain operating thresholds. In daily production work, the use method, zero adjustment, use environment, daily sample preservation and even readings all need to be learned and memorized, and the objects of memory are multi-step processes or Multi-link combination, it is difficult to fully implement and use in general positions
[0004] The parallelism between planes is an important parameter to control and check product quality in the production process, but there is currently a lack of accurate and easy-to-use parallelism measurement tools between planes

Method used

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  • An Optical Plane Parallelism and Micro-displacement Measuring System
  • An Optical Plane Parallelism and Micro-displacement Measuring System
  • An Optical Plane Parallelism and Micro-displacement Measuring System

Examples

Experimental program
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Effect test

Embodiment 1

[0052] refer to figure 1 , Figure 3-Figure 5 , this embodiment provides an optical micro-displacement measurement system, including a first housing 10, a light source assembly 20, a first reflection assembly 30 and a projection wall S1;

[0053] The first reflection assembly 30 includes an optical reflector 31, and the optical reflector 31 includes a reflective surface 32;

[0054] The optical reflector 31 is strip-shaped and includes two ends, one end is connected to the first housing 10 as a fixed end 311, and the other end is a free end 312;

[0055] The light source assembly 20 includes a laser light source 21 and a slit unit 22, and the laser light source 21 radiates to the slit unit 22 to form a line light source 23;

[0056] The line light source 23 can shoot toward the reflective surface 32 of the optical reflector 31; and, the intersection line between the line light source 23 and the reflective surface 32 is perpendicular to the incident direction of the line ligh...

Embodiment 2

[0078] This embodiment is realized on the basis of embodiment 1, refer to Figure 10 , the side wall of the first housing 10 includes a second reflective assembly 60, and the second reflective assembly 60 includes a reflective surface 32; the line light source 23 is reflected by the first reflective assembly 30, and radiates to the second reflective assembly. The reflective surface 32 of the component 60 is reflected and projected to the projection wall S1 on the side opposite to the side of the first casing 10 where the second reflective component 60 is disposed and displayed.

[0079] By reflecting the line light source 23 once and then projecting it on the wall S1 to obtain the visible intersecting line 41, the tiny displacement of the measured object can be amplified to measure the displacement. The motion accuracy observed by the apparent addition line is limited, and it is not suitable for scenes that require high displacement accuracy measurement.

[0080] In this embo...

Embodiment 3

[0089] This embodiment is proposed on the basis of embodiment 1, with reference to Figure 12, the system includes a third reflective assembly 70, the third reflective assembly 70 includes a reflective surface 32; the third reflective assembly 70 is disposed at an end of the first housing 10, and the end is connected to The ends of the first reflection assembly 30 are arranged opposite; and, it is fixedly connected with the first housing 10 .

[0090] The purpose of this embodiment is the same as that of Embodiment 2, and both are to improve the measurement accuracy of the displacement. The third reflective assembly 70 is arranged at one end of the first housing 10, and the line light source 23 is reflected by the third reflective assembly 70. Then shoot on the projection wall S1. There is a certain included angle between the third reflective assembly 70 and the end of the first housing 10 to which it is close. The last line light source 23 can be irradiated on the projectio...

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Abstract

The invention provides an optical plane parallelism and micro-displacement measurement system. The optical micro-displacement measurement system includes a first housing, a light source assembly, a first reflection assembly, and a projection wall S1; the first reflection assembly includes an optical reflector, and the optical reflection The body includes a reflective surface; the optical reflector includes a fixed end and a free end; when the position of the free end of the optical reflector changes relative to the fixed end, the angle between the incident plane of the line light source and the intersection of the reflective plane changes accordingly; A housing is provided with a projection wall S1, and the line light source is reflected by the reflective surface and radiates to the projection wall S1 to intersect and form a visible intersection line. The optical plane detection system is based on the optical micro-displacement detection system, and the light source assembly is provided with two sets of line light sources, which are respectively arranged close to two of the four sides of the first housing; and, at least on the first housing Projection walls S1 are provided on both sides of the , and the projection walls S1 are used to display the intersection line between the line light source and the projection wall S1 .

Description

technical field [0001] The invention belongs to the technical field of general displacement measurement, and relates to the measurement technology of micro-displacement and micro-parallelism of planes, in particular to a measurement system of plane parallelism and micro-displacement based on influencing optical paths. Background technique [0002] Micro-displacement measurement usually requires high-precision instruments and equipment to achieve. Such as by means of vernier calipers, micrometers, or by means of computer image processing technology. [0003] However, complex instruments and equipment have certain operating thresholds. In daily production work, the use method, zero adjustment, use environment, daily sample preservation and even readings all need to be learned and memorized, and the objects of memory are multi-step processes or The combination of multiple links makes it difficult to fully implement and use it in general positions. [0004] The parallelism bet...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/26G01B11/02
CPCG01B11/26G01B11/02
Inventor 刘展花
Owner SHENZHEN VINCENT TECH CO LTD