Wafer laser engraving machine and using method thereof
A laser engraving machine and wafer technology, applied in the field of engraving machines, can solve the problems of inability to realize mechanical automatic double-sided engraving, difficulty in ensuring flatness, and reducing processing accuracy, so as to improve processing efficiency and finished product quality, and achieve a large engraving range. Guaranteed accuracy
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Embodiment 1
[0063] as attached Figure 1-2 As shown, a wafer laser engraving machine includes a chassis 1, a laser device 2, a control device and a casing 3; a support frame 101 and a support plate 102 are arranged above the chassis 1;
[0064] The control device is arranged in the casing 1 and on the casing 3, the casing 3 is arranged above the casing 1, and the laser device 2 is arranged inside the casing 3;
[0065] The laser device 2 includes a loading and unloading device 4, a handling and turning device 5, an identification device 6, an engraving device 7 and a first transmission device 8;
[0066] The loading and unloading device 4, the identification device 6, and the engraving device 7 are arranged on the support frame 101, and the transfer and turning device 5 is arranged on the support plate 102;
[0067] The first conveying device 8 is arranged below the loading and unloading device 4 , the identifying device 6 and the engraving device 7 .
[0068] Further, the chassis 1 is ...
Embodiment 2
[0086] This embodiment is carried out on the basis of the above-mentioned embodiment 1, and mainly introduces an engraving device.
[0087] as attached Figure 7 As shown, the engraving device 7 includes a bracket 701, the bracket 701 is provided with a support platform 702, the support platform 702 is provided with a laser 703, and the bracket 701 is sequentially provided with a beam expander 705 and a vibrating mirror 704 A field lens is further arranged under the vibrating mirror 704, so as to realize the propagation of the laser light path.
[0088] The field mirror is fixed below the vibrating mirror 704, and is fixed on the vibrating mirror 704 through the field mirror segment ring, and a diffuse aperture is formed in the field mirror, which can expand the engraving range and improve the definition of the edge of the engraving pattern .
Embodiment 3
[0090] This embodiment is carried out on the basis of the above-mentioned embodiment 1, and mainly introduces a turning device and a wafer tray.
[0091] A turning device 520 includes a rotating device and a shift fork 521 , the rotating device includes a rotating cylinder 522 and a rotating joint 523 , and the rotating joint 523 is fixedly connected to the shifting fork 521 .
[0092] Further, the shift fork 521 includes a flange and a suction cup, the suction cup is located at one end close to the rotating shaft 523, and the flange is at the other end.
[0093] Further, the suction cup has a polygonal structure, and a gap is opened inside the suction cup.
[0094] A wafer tray 805 includes a motor, a rotating shaft and a tray. A suction cup is connected to the rotating shaft, and the suction cup is connected to the tray by bolts.
[0095] Further, the suction cup is provided with continuous and uniform small holes.
[0096]Further, the flipping device and the wafer tray ar...
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