Atomic layer deposition system with linear series connection property
An atomic layer deposition, linear technology, applied in coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of position deviation, uneven deposition of coil materials, etc.
Pending Publication Date: 2021-11-12
SHENZHEN YUANSU OPTOELECTRONICS TECH CO LTD
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Problems solved by technology
[0002] In the prior art, the atomic layer deposition process continuously deposits a single layer of atomic layers on the surface of the coil material during the transmission process of the coil material; during the process of transmitting the coil material from the vacuum unwinding device to the vacuum winding device, position deviation may occur , resulting in uneven coil deposition
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[0036] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0037] It should be noted that all directional indications (such as up, down, left, right, front, back...) in the embodiments of the present invention are only used to explain the relationship between the components in a certain posture (as shown in the accompanying drawings). Relative positional relationship, movement conditions, etc., if the specific posture changes, the directional indication will also change accordingly.
[0038] In addition, the ...
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The invention discloses an atomic layer deposition system with a linear series connection property. The atomic layer deposition system with the linear series connection property comprises a vacuum unwinding device, a vacuum winding device, at least one vacuum deposition device and at least one vacuum wound material auxiliary device. Wound materials sleeve the vacuum unwinding device, and the vacuum unwinding device is used for pulling out the wound materials. The vacuum winding device and the vacuum unwinding device are arranged in a separation mode, and the vacuum winding device is used for recovering the wound materials which are pulled out. The vacuum deposition devices are arranged between the vacuum unwinding device and the vacuum winding device and are sequentially connected. The vacuum deposition devices are used for conducting deposition treatment on the wound materials. Each vacuum wound material auxiliary device is arranged between the two adjacent corresponding vacuum deposition devices, and / or between the corresponding vacuum deposition device and the vacuum unwinding device, and / or between the corresponding vacuum deposition device and the vacuum winding device. According to the technical scheme, the positions of the wound materials in the conveying process are adjusted so that the atom deposition effect on the surfaces of the wound materials can be improved.
Description
technical field [0001] The invention relates to the technical field of atomic layer deposition, in particular to a linear series atomic layer deposition system. Background technique [0002] In the prior art, the atomic layer deposition process continuously deposits a single layer of atomic layers on the surface of the coil material during the conveying process of the coil material; during the process of conveying the coil material from the vacuum unwinding device to the vacuum winding device, position deviation may occur , resulting in uneven coil deposition. [0003] The above content is only used to assist in understanding the technical solution of the present application, and does not mean that the above content is admitted as prior art. Contents of the invention [0004] The main purpose of the present invention is to provide a linear series atomic layer deposition system, aiming to adjust the position of the coil material during the conveying process, so as to impro...
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Login to View More IPC IPC(8): C23C16/455C23C16/54C23C16/52
CPCC23C16/45544C23C16/545C23C16/52
Inventor 李哲峰乌磊聆领安辛
Owner SHENZHEN YUANSU OPTOELECTRONICS TECH CO LTD