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Substrate cleaning device and substrate cleaning method thereof

A technology for cleaning devices and substrates, applied in cleaning methods and utensils, cleaning methods using tools, cleaning methods using liquids, etc., can solve problems such as loss of product yield and poor cleaning effect, and reduce product yield loss. , ideal measurement accuracy, avoid the effect of abnormal graphics

Pending Publication Date: 2021-11-16
CHANGXIN MEMORY TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, after the existing substrate cleaning device cleans the substrate, the cleaning effect is often poor and the product yield is lost.

Method used

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  • Substrate cleaning device and substrate cleaning method thereof
  • Substrate cleaning device and substrate cleaning method thereof
  • Substrate cleaning device and substrate cleaning method thereof

Examples

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Embodiment Construction

[0028] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Embodiments of the application are given in the drawings. However, the present application can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of this application more thorough and comprehensive.

[0029] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terminology used herein in the description of the application is only for the purpose of describing specific embodiments, and is not intended to limit the application.

[0030] Spatial terms such as "below", "below", "below", "under", "on", "above", etc., in This may be u...

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PUM

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Abstract

The embodiment of the invention relates to a substrate cleaning device and a substrate cleaning method thereof. The substrate cleaning device comprises a machine body; a first cleaning arm which is movably installed on the machine body, wherein the first cleaning arm moves along the machine body to make contact with the first surface of the substrate; a measuring module which is used for measuring the horizontal measurement value of the first cleaning arm; and a horizontal adjusting mechanism which adjusts the horizontal measurement value to be within a preset range according to the measurement result of the measurement module, wherein the first cleaning arm is in contact with the first surface of the substrate to clean the substrate in the state of the horizontal measurement value within the preset range. The embodiment of the invention can effectively improve the cleaning effect.

Description

technical field [0001] The present application relates to the technical field of integrated circuits, in particular to a substrate cleaning device and a substrate cleaning method thereof. Background technique [0002] In the semiconductor manufacturing process, a substrate cleaning device is often used to clean the substrate. During the cleaning process, mechanical force (one end in the Mech length direction and one end in the nic length direction l force) can be used to remove impurities on the substrate surface, thereby reducing substrate surface defects and improving product yield. [0003] The mechanical force mainly touches the surface of the substrate through the cleaning arm, and then cleans the surface of the substrate by friction, so as to physically remove the magazine particles and achieve the effect of cleaning the substrate. [0004] However, after cleaning the substrate, the existing substrate cleaning device often has a poor cleaning effect and a loss of prod...

Claims

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Application Information

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IPC IPC(8): H01L21/67B08B3/02B08B1/04B08B13/00
CPCH01L21/67046H01L21/67051B08B3/02B08B13/00B08B1/32B08B1/12Y02P80/30
Inventor 彭竑凯
Owner CHANGXIN MEMORY TECH INC