Electrode system prepared by an electrochemical method

Abstract

The invention discloses an electrochemical method for preparing an electrode system, comprising a displacement system, a fast steaming system, a stepped electrodeposition system, a pulsed mobile deposition system, an ultrasonic cleaning system and a low-pressure flushing system which are arranged in sequence below the displacement system; First, step-type electrodeposition is used, and the deposition distance is adjusted by controlling temperature, PH, and replenishing electrolyte at any time, and the deposition voltage is adjusted to form a rough full-coverage deposition effect. The electrode surface deposition effect is good, and there is no need to perform multiple reciprocating operations, the deposition efficiency is high, and time and effort are saved. The invention adopts the fast steaming system to spray the evaporating agent first, then use the drying lamp to quickly evaporate and dry and alternate cold and hot air blowing to quickly evaporate and clean the electrode, which not only has a good cleaning effect, but also has a high drying efficiency.

Description

technical field [0001] The invention relates to the technical field of electrode preparation, in particular to an electrochemical method for preparing an electrode system. Background technique [0002] At present, the biggest problem in the use of battery electrodes is that the battery cycle and continuous charging and discharging capabilities are insufficient, and the overall battery loss is still high. This is mainly because the film quality of the electrode surface and interface is easily damaged. For example, the original electrochemical deposition coating The installation process is not uniform, or the long-term work in the electrolyte with high pH will cause non-uniform damage to the film layer. In order to solve this problem, many R&D or production units use an improved electrochemical deposition scheme to form a film on the electrode, and form a high-density, homogeneous and uniform film layer on the electrode. [0003] However, the electrochemical process is too co...

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Problems solved by technology

[0004] (1) Most of the current electrochemical deposition devices adopt a single capacitive deposition scheme, and the film is deposited on the surface of the electrode through multiple reciprocating operations.

However, this scheme is greatly affected by the effect of the first deposition, for example, the spot area formed during the first deposition will cause the spot area to further expand to form a non-uniform area in the subsequent deposition process

And the simple capacitive deposition scheme is very affected by the uniformity of the electrolyte and the average degree of the electric field distribution, and the temperature difference of the electrolyte temperature field will also greatly affect the deposition effect

Moreover, this scheme requires repeated operations, which is not only time-consuming and labor-intensive, but also because the applicable scope and effect of each deposition are fixed, it is difficult to form a complementary deposition effect

[0005] (2) Most of the existing equipment uses simple high-pressure flushing before deposition to achieve the effect of cleaning the electrode surface, but on the one hand, high-pressure flushing is easy to form scratches on the electrode surface, and it is easy to form a deposition concentration area in the subsequent deposition process ; On the other hand, due to the limited impact angle, it is difficult to completely clean the electrode surface, and the remaining impurities will make segregation deposition prone to occur in the subsequent electrodeposition process

[0006] (3) The surface cleaning of the current device after deposition is simply soaking and washing. It is difficult to remove impurities, grease, etc. that have not completely adhered to the electrode surface after electrodeposition, and the cleaning effect is not good, or some equipment uses high-pressure washing. Remove impurities on the surface of the electrode after deposition, which will cause the newly formed electrodeposited film to fall off and damage the electrode

[0007] (4) The stability of the current electrochemical deposition device is still not high enough in the process of hanging and moving. It often occurs that the deposition position changes due to slight shaking during the electrochemical deposition process, forming a spotty and uneven thickness coating

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