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Mask stage vibration isolation device of photoetching machine

A technology of mask table and lithography machine, which is applied in the direction of photolithography exposure device, photomechanical equipment, micro-lithography exposure equipment, etc., to achieve stable and reliable support

Active Publication Date: 2021-12-28
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the prior art, there is no vibration isolation support device specially designed for the connection between the base of the mask table system and the top of the projection objective lens sleeve

Method used

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  • Mask stage vibration isolation device of photoetching machine
  • Mask stage vibration isolation device of photoetching machine
  • Mask stage vibration isolation device of photoetching machine

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Embodiment Construction

[0037] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0038] In the description of the present application, it should be understood that the terms "bottom", "top", "center", etc. used in the present application to indicate the orientation or positional relationship are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of description The present invention and simplified description do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and thus should not be construed as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descri...

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Abstract

The invention relates to the field of vibration suppression, and discloses a mask stage vibration isolation device of a photoetching machine. The device comprises a mask stage base, a projection objective sleeve and a connecting device for connecting the mask stage base and the projection objective sleeve, wherein the connecting device is a flexible supporting device, and the vertically placed flexible sheets are placed in an isosceles triangle shape. The invention has the beneficial effects that the connecting form between the reticle stage base and the projection objective sleeve is changed from rigid connection to flexible connection through the flexible connecting device, and the three supporting assemblies of the connecting device are arranged in the isosceles triangle shape, so supporting is stable and reliable; meanwhile, the connecting device has the characteristic of low rigidity and even zero rigidity in the horizontal direction of the mask table by utilizing the vertically arranged flexible sheet, so a vibration isolation effect is achieved in the horizontal direction of the mask table.

Description

technical field [0001] The invention relates to the field of vibration suppression, in particular to a vibration isolation device for a mask table of a photolithography machine. Background technique [0002] Photolithography has always played a vital role in the development of the integrated circuit (IC) industry. Among them, the representative lithography machine integrates ultra-precision measurement and motion control technology and lithography technology to realize the function of exposing the chip pattern on the mask plate to the silicon wafer on the workpiece table. In the stepper lithography machine, the mask table exposes and etches the mask pattern on the wafer through the light source illumination system, projection objective lens and workpiece table, where the base of the mask table system is directly rigid to the top of the projection objective lens sleeve connected. During the working process of the mask table of the lithography machine, the subtle vibration g...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/709G03F7/70733
Inventor 吴剑威李昌其张银晏祯卓潘健生赵鹏越谭久彬
Owner HARBIN INST OF TECH
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