Manufacturing method of coreless substrate
A manufacturing method and coreless substrate technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as increasing production costs, achieve higher yields, better substrate surface smoothness, and improve raw material usage rate effect
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[0070] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.
[0071] see Figure 1-Figure 30 , the manufacturing method of the coreless substrate, comprising the following steps:
[0072] S1, adding the first photoresist layer 21 on the top surface of the substrate copper 1, such as figure 2 As shown, exposure and development are carried out to form the first photoresist pattern, such as image 3 Shown; Wherein, the thickness of substrate copper 1 is 0.05-1.0mm, the best is 0.08-0.12mm, adjust the thickness of the first photoresist layer 21 according to the height of the first interlayer conductor 31, higher than the interlayer conductor 5-10 microns, the thickness of the first photoresist layer 21 is 30-100 microns;
[0073] S2. Electroplate the first interlayer conductor 31 in the first photoresist pattern, such as Figure 4 shown;
[0074] S3, peeling off the first photoresist layer 21, leaving ...
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