SiC JBS cellular structure and preparation method thereof
A cell and graphic technology, applied in the field of SiCJBS cell structure and preparation, can solve the problem of unbalanced leakage current and anti-surge current ability, achieve improved anti-surge current ability, wide application range, and increase inrush current Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0058] A SiC JBS cell structure of the present invention includes the following steps: first, deposit an oxide layer on the SiC epitaxial layer to form an implanted masking region; then, carry out photolithography of cell patterns on the oxide layer, such as figure 1 As shown, the first cell and the second cell; the periphery of the second cell is arranged with several first cells; the cross section of the filling area of the first cell is the third figure from the inside to the outside, the first The second figure, the first figure; the area type corresponds to SBD area, P+ area, SBD area or P+ area, SBD area, P+ area in turn; the cross section of the filled area of the second cell is the fourth figure, and the area type is P-type doped region; the first figure is a regular hexagon, the second figure is a regular hexagon, the third figure is a circle or a regular hexagon, and the fourth figure is a regular hexagon. The geometric size of the first figure in the cell is 25u...
Embodiment 2
[0062] A SiC JBS cell structure of the present invention includes the following steps: first, deposit an oxide layer on the SiC epitaxial layer to form an implanted masking region; then, carry out photolithography of cell patterns on the oxide layer, such as figure 1 As shown, the first cell and the second cell; the periphery of the second cell is arranged with several first cells; the cross section of the filling area of the first cell is the third figure from the inside to the outside, the first The second figure, the first figure; the area type corresponds to SBD area, P+ area, SBD area or P+ area, SBD area, P+ area in turn, the cross section of the filled area of the second cell is the fourth figure, and the area type is P-type doped region; the first figure is a regular hexagon, the second figure is a regular hexagon, the third figure is a circle or a regular hexagon, and the fourth figure is a regular hexagon. The geometric size of the first figure in the cell is 100...
Embodiment 3
[0064] A SiC JBS cell structure of the present invention includes the following steps: first, deposit an oxide layer on the SiC epitaxial layer to form an implanted masking region; then, carry out photolithography of cell patterns on the oxide layer, such as figure 1 As shown, the first cell and the second cell; the periphery of the second cell is arranged with several first cells; the cross section of the filling area of the first cell is the third figure from the inside to the outside, the first The second figure, the first figure; the area type corresponds to SBD area, P+ area, SBD area or P+ area, SBD area, P+ area in turn, the cross section of the filled area of the second cell is the fourth figure, and the area type is P-type doped region; the first figure is a regular hexagon, the second figure is a regular hexagon, the third figure is a circle or a regular hexagon, and the fourth figure is a regular hexagon. The geometric dimension L of the first figure in the cell...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com