Grid control diode with high surge current resistance
A gate-controlled diode and surge current technology, which is applied in the field of gate-controlled diodes, can solve the problems of reducing the reliability of the gate oxide layer of the gate-controlled diode, the thick drift region of the gate-controlled diode, and the inability to contribute to the surge current, etc., to improve The overall anti-surge capability, reducing the conduction voltage drop, and reducing the effect of recombination
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[0029] The principles and features of the present invention will be described below with reference to the accompanying drawings. The examples are only used to explain the present invention, but not to limit the scope of the present invention.
[0030] This embodiment provides a gated diode with high anti-surge current capability. The cell structure is as follows: figure 1 As shown, it includes backside ohmic contact alloy 1, N-type heavily doped substrate 3, P-type heavily doped substrate 2, N-type base region 4, P-type heavily doped emitter region 5, and P-type doped well region 6 , N-type doped JFET region 7, N-type heavily doped source region 9, N-type lightly doped channel 8, front metal 10, gate oxide layer 11 and polysilicon 12;
[0031] The N-type heavily doped substrate 3 is located at the upper left of the backside ohmic contact alloy 1; the P-type heavily doped substrate 2 is located at the upper right of the backside ohmic contact alloy 1; the N-type base region 4 ...
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