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Mask rule checking for curvilinear masks for electronic circuits

An electronic circuit and mask technology, applied in the field of electronic design automation, can solve problems such as inability to handle masks

Pending Publication Date: 2022-02-01
SYNOPSYS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Conventional mask rule checking techniques designed for Manhattan masks cannot handle masks including curved shapes

Method used

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  • Mask rule checking for curvilinear masks for electronic circuits
  • Mask rule checking for curvilinear masks for electronic circuits
  • Mask rule checking for curvilinear masks for electronic circuits

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Embodiment Construction

[0053] The EDA process includes steps to process the mask, including mask rule checking (MRC) to ensure that the mask complies with certain rules. Mask rule checking depends on the equipment used to manufacture integrated circuits and the corresponding mask checking capabilities. Conventional circuit design techniques use Manhattan masks, where the sides of the geometric shape are parallel to the X and Y axes, and the geometric shape is rectangular. These rules typically check constraints such as minimum width between polygon sides, minimum space allowed between polygons and similar metrics between corners, minimum area, etc. For mask writers that also handle 45 degree edges, there are additional rules specified between edges and corners, sharp angle checks, etc.

[0054] Advances in mask writing techniques allow the use of curved masks with more flexible geometries than Manhattan shapes. For example, a curved shape might allow complex polygons or curved edges. Conventional...

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Abstract

A system performs mask rule checks (MRC) for curvilinear shapes. The width of a curvilinear shape is different along different parts of the shape. A medial axis for a curvilinear shape is determined. The medial axis is trimmed to exclude portions that are within a threshold distance from comers or too far from edges. The trimmed medial axis is used to perform width checks for mask rules. The system generates medial axis between geometric shapes and uses it to determine whether two geometric shapes are at least a threshold distance apart. The system performs acute angle checks for sharp comers. The system determines angles using lines drawn from vertices to end points on the boundary of the shape that are at a threshold distance. These angles are used for checking acute angle mask rule violations.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of U.S. Patent Application Serial No. 62 / 858,714, filed June 07, 2019, the contents of which are incorporated herein by reference. technical field [0003] The present disclosure relates generally to the field of electronic design automation, and more particularly to mask rule checking for electronic circuits. Background technique [0004] The electronic design automation (EDA) process includes a physical verification phase during which the layout design is checked to ensure that manufacturing constraints are correct, such as design rule checking (DRC) constraints, electrical constraints, and lithographic constraints. The tape-out stage creates data to be used to produce photolithographic masks. During mask data preparation, the tape-out data is used to produce photolithographic masks, which are used to produce finished integrated circuits. [0005] Mask rule checking is performed...

Claims

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Application Information

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IPC IPC(8): G06F30/398G06F30/331G06F30/327
CPCG06F30/398G06F30/331G06F30/327G06T7/0006G06T7/68G06T2207/30148G06T2207/30172G03F1/36
Inventor T·C·塞西尔
Owner SYNOPSYS INC