Polishing method for high-surface-precision high-roughness optical device

Abstract

The invention discloses a polishing method for a high-surface-precision high-roughness optical device, and relates to the technical field of optical device processing. The polishing method comprises the following steps of: 1, manufacturing a polishing disc substrate; 2, manufacturing a rare earth polishing disc; 3, conducting profiling machining on the polishing disc; 4, subjecting the polishing disc to magneto-rheological finishing; and 5, polishing the optical device. According to the invention, proportioned rare earth is used for manufacturing the rare earth polishing disc, the polishing disc with high surface precision is machined according to a to-be-machined part through profiling, and the polishing disc is polished in a magneto-rheological polishing mode, so the surface smoothness of the polishing disc is improved; then the manufactured polishing disc is used for polishing a workpiece, and polishing efficiency is greatly improved through the rare earth polishing disc; and the polishing disc having been subjected to profiling machining can also improve the surface precision of the workpiece, polishing of the workpiece is completed, the surface precision of the workpiece is achieved at the same time, a requirement on polishing workers is low, working efficiency is high, and production economic benefits are good.

Description

technical field [0001] The invention relates to the technical field of optical device processing, in particular to a high-surface and high-roughness optical device polishing method. Background technique [0002] Optical instruments are a very important component category in the instrumentation industry, and are indispensable tools for observation, testing, analysis, control, recording and transmission in various fields of industrial and agricultural production, resource exploration, space exploration, scientific experiments, national defense construction and social life , with the development of society, the requirements for output optical power and spot quality in various fields are constantly increasing. [0003] The existing polishing of optical devices has unstable processing, roughness and high surface accuracy cannot be combined, the steps of polishing optical devices are complicated, the professional skills of the staff are high, the work efficiency is low, and the pr...

AI Technical Summary

Problems solved by technology

[0004] Based on this, the purpose of the present invention is to provide a high-surface and high-roughness optical device polishing method to solve the existing processing instability in the polishing of optical devices, roughness and high surface accuracy cannot be combined, The steps of polishing optical devices are complicated, require high professional skills of the staff, low work efficiency, long processing cycle, and high production costs.