Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Degradable mask and preparation method thereof

A technology of masks and polylactic acid, which is applied in the field of masks, can solve the problems of slow degradation of masks and environmental damage, and achieve the effects of small site ratio, high charge load, and simple process

Active Publication Date: 2022-02-15
SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above-mentioned deficiencies in the prior art, the object of the present invention is to provide a degradable mask and a preparation method thereof, aiming at solving the degradation of the mask made in the prior art Slow speed, causing damage to the environment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Degradable mask and preparation method thereof
  • Degradable mask and preparation method thereof
  • Degradable mask and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Dissolve polylactic acid and diatomaceous earth in DMF at a mass ratio of 9:1 to prepare a spinning solution with a mass concentration of 0.1g / mL, draw the mixed solution with a needle, and fix the distance between the collecting plate and the spinneret at 12cm , start spinning after setting the DC voltage of 15KV. After electrospinning, a layer of polylactic acid / diatomaceous earth composite degradable mask was collected on the collector.

Embodiment 2

[0047] Dissolve polylactic acid and diatomaceous earth in DMF at a mass ratio of 5:5 to prepare a spinning solution with a mass concentration of 0.1 g / mL, draw the mixed solution with a needle, and fix the distance between the collecting plate and the spinneret at 15 cm , Start spinning after setting the DC voltage of 20KV. After electrospinning, a layer of polylactic acid / diatomaceous earth composite degradable mask was collected on the collector.

Embodiment 3

[0049] Dissolve polylactic acid and diatomaceous earth in DMF at a mass ratio of 2:8 to prepare a spinning solution with a mass concentration of 0.1g / mL, draw the mixed solution with a needle, and fix the distance between the collecting plate and the spinneret at 17cm , start spinning after setting the DC voltage of 25KV. After electrospinning, a layer of polylactic acid / diatomaceous earth composite degradable mask was collected on the collector.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
concentrationaaaaaaaaaa
tensile strengthaaaaaaaaaa
Login to View More

Abstract

The invention discloses a degradable mask and a preparation method thereof. The preparation method comprises the steps that polylactic acid is dissolved in an organic solvent, and a polylactic acid solution is obtained; a biomass silicon dioxide material is placed into the polylactic acid solution, and ultrasonic dispersion treatment is carried out to obtain a suspension; and the suspension liquid is placed in an electrostatic spinning machine to be subjected to electrostatic spinning film forming, and the degradable mask is prepared. The prepared degradable mask can be completely degraded within about one and a half months, the degradable mask has the advantages of being small in fiber size and high in charge load, and the filtering effect on 0.3 micron particles reaches 99.99% and far exceeds the N95 mask standard; and the degradable mask is prepared by adopting the electrostatic spinning machine, the process is simple, the field proportion is small, and the mask is suitable for being produced in small factories such as families.

Description

technical field [0001] The invention relates to the technical field of masks, in particular to a degradable mask and a preparation method thereof. Background technique [0002] Face masks are one of the best defenses against the virus, and according to health organizations, each mask is only good for 12-24 hours. People all over the world consume too many masks every day, which makes the processing of masks a severe test. Since the raw material of current masks is mainly polypropylene (PP), this material takes hundreds of years to degrade under natural conditions, causing serious damage to the environment. [0003] Therefore, the prior art still needs to be improved and developed. Contents of the invention [0004] In view of the above-mentioned deficiencies in the prior art, the object of the present invention is to provide a degradable mask and a preparation method thereof, aiming at solving the problem that the mask produced by the prior art has a slow degradation rat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D04H1/728D04H1/435D01F1/10D01F6/92A41D13/11A41D31/04
CPCD04H1/728D04H1/435D01F1/10D01F6/92A41D13/11A41D31/04D10B2401/12
Inventor 孙大陟章晨涛孙嘉逊陆正阳杨烨
Owner SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products