Safety protection pressure relief system for epitaxial process equipment and epitaxial process equipment

Abstract

The invention relates to the field of semiconductor manufacturing, in particular to a safety protection pressure relief system for epitaxy process equipment and the epitaxy process equipment, the system is used for adjusting air pressure in a reaction cavity of the epitaxy equipment, and the safety protection pressure relief system for the epitaxy process equipment comprises an active pressure relief pipeline connected with an outlet of the reaction cavity; a passive pressure relief pipeline which is connected with the outlet of the reaction cavity, wherein an explosion valve is arranged on the passive pressure relief pipeline, and the explosion valve is used for relieving pressure when the pressure in the reaction cavity is abnormal and the active pressure relief pipeline fails; and a controller which is electrically connected with the active pressure relief pipeline and is used for acquiring pressure information in the reaction cavity and controlling a switch of the active pressure relief pipeline according to the pressure information so as to adjust the air pressure in the reaction cavity. By designing the active pressure relief pipeline and the passive pressure relief pipeline, dual protection is achieved when the air pressure in the reaction cavity is abnormal, and the personal and property safety of personnel and equipment is effectively guaranteed.

Description

technical field [0001] The present application relates to the field of semiconductor manufacturing, in particular, to a safety protection pressure relief system for epitaxial process equipment and epitaxial process equipment. Background technique [0002] The epitaxial growth process is carried out in a high-temperature and low-pressure environment. The reaction chamber is usually a water-cooled quartz chamber, and the gas participating in the chemical reaction is mostly flammable, explosive and toxic. During the process, a certain amount of reaction gas is fed into the front end of the reaction chamber, and the vacuum pump at the rear end maintains a certain pumping speed to draw vacuum. When the two reach a balance, the pressure of the reaction chamber is kept stable. However, when the equipment is running, accidents may occur, such as a sudden failure of the vacuum pump or vacuum valve, and the gas cannot be discharged, the pressure of the reaction chamber will rise rapid...

AI Technical Summary

Problems solved by technology

[0005] The purpose of this application is to provide a safety protection pressure relief system for epitaxial process equipment and epitaxial process equipment, aiming to solve the safety problems caused by abnormal pressure during the epitaxial process, so as to ensure production efficiency

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