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Array substrate, preparation method and display panel

A technology for array substrates and display panels, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve problems such as intrusion into oxide semiconductor layers, and achieve the effect of improving stability

Pending Publication Date: 2022-02-25
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
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Problems solved by technology

[0004] Embodiments of the present application provide an array substrate, a preparation method, and a display panel to solve the problem of H intrusion into the oxide semiconductor layer

Method used

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  • Array substrate, preparation method and display panel
  • Array substrate, preparation method and display panel
  • Array substrate, preparation method and display panel

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Embodiment Construction

[0049]The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application. In addition, it should be understood that the specific implementations described here are only used to illustrate and explain the present application, and are not intended to limit the present application. In this application, unless stated to the contrary, the used orientation words such as "up" and "down" usually refer to up and down in the actual use or working state of the device, specifically the direction of the drawing in the drawings ; while "inside" and "outside" refer to the outline of t...

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Abstract

The invention discloses an array substrate, a preparation method of the array substrate and a display panel. The preparation method of the array substrate comprises the steps that a substrate is provided; an oxide semiconductor layer is arranged on the substrate, fluorination processing is carried out on the oxide semiconductor layer to form the oxide semiconductor layer containing fluorine; and a first passivation layer is formed over the substrate and the oxide semiconductor layer. According to the invention, the oxide semiconductor layer is fluorinated, so that the oxide semiconductor layer contains fluorine, injection of H in the manufacturing process of the first passivation layer or the subsequent film layer can be blocked, the defects of the oxide semiconductor layer are overcome, and the performance of the array substrate is improved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to an array substrate, a manufacturing method and a display panel. Background technique [0002] As the current mainstream display, liquid crystal displays usually have display modes such as VA, HVA, IPS, and TN; among them, IPS and FFS control the liquid crystal deflection through parallel electric fields, which can protect the picture effect from being damaged to the greatest extent when subjected to external forces, and Has a better viewing angle. Active matrix-driven liquid crystal display technology utilizes the bipolar polarization characteristics of liquid crystals, and controls the alignment direction of liquid crystal molecules by applying an electric field to realize the switching effect on the direction of the light path of the backlight source. Thin film transistors (TFTs) are generally employed to control the electric field within each pixel. Semiconductor ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/12H01L21/77G02F1/1362
CPCH01L27/1225H01L27/127G02F1/1362
Inventor 史文
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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