Semiconductor structure and forming method thereof

Abstract

The invention discloses a semiconductor structure and a forming method thereof. The semiconductor structure comprises a substrate; the first dielectric layer is located on the substrate, and the first dielectric layer comprises a first interconnection hole; the first barrier layer covers the inner wall and the bottom of the first interconnection hole; the first metal layer is located in the first interconnection hole; a second barrier layer covering an edge region of a top surface of the first metal layer; the second dielectric layer is located on the first dielectric layer, the second dielectric layer comprises a second interconnection hole, the second interconnection hole exposes a part of the top surface of the first metal layer, and the size of the bottom of the second interconnection hole is smaller than that of the top of the first interconnection hole; the third barrier layer covers the side wall of the second interconnection hole, and the third barrier layer is in contact with the second barrier layer; and the second metal layer is located in the second interconnection hole, and the second metal layer is in direct contact with the first metal layer. The contact resistance between the metal layers of the semiconductor structure is reduced.

Description

technical field [0001] The present application relates to the field of semiconductors, in particular to a semiconductor structure and a method for forming the same. Background technique [0002] The manufacture of semiconductor integrated circuits is an extremely complicated process, aiming to shrink and manufacture various electronic components and circuits of a specific circuit on a semiconductor substrate. After the feature size (CD) of semiconductor devices enters the deep submicron stage, in order to obtain faster computing speed, larger data storage capacity and more functions, this requires that the integration level of semiconductor devices needs to be continuously improved. The number and density of layers increases accordingly. [0003] As the line width of the manufacturing process continues to shrink, the resistance between the metal layers will increase more significantly, which will bring about the problem of RC delay (delay) of the metal interconnection and a...

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Problems solved by technology

[0003] With the continuous shrinking of the process line width, the increase of the resistance between the metal layers will become more and more significant, which will bring about the problem of RC delay (delay) of the metal interconnection and affect the electrical performance of the device.

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