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322results about How to "High capacitance" patented technology

Non-volatile memory devices and method thereof

Non-volatile memory devices and a method thereof are provided. A non-volatile memory device according to an example embodiment of the present invention may include a first transistor including a source, a drain, and a control gate, a first storage node coupled to the first transistor, the first storage node configured to store information in a first manner, a first diode having a first end connected to the source of the transistor, the first diode configured to rectify a flow of current from the source of the transistor and a second storage node connected to a second end of the first diode, the second storage node configured to store information in a second manner. Another non-volatile memory device according to another example embodiment of the present invention may include a semiconductor substrate having a first conductivity type including an active region defined by a device isolating layer, a source region and a drain region formed by doping an impurity having a second conductivity type in the active region, a control gate electrode insulated from the active region, the control gate electrode extending across the active region disposed between the source region and the drain region, a first storage node layer interposed between the active region and the control gate electrode configured to store information in a first manner, a second storage node layer disposed on the source region configured to store information in a second manner and a diode interposed between the source region and the second storage node layer to rectify a flow of current to the source region. The example method may be directed to obtaining a higher storage capacity per cell area in either of the above-described example non-volatile memory devices.
Owner:SAMSUNG ELECTRONICS CO LTD

Semiconductor Optical Device and Manufacturing Method Thereof

A low reflective window structure in an existent electro-absorption optical modulator involves a trading off problem between the increase in the parasitic capacitance and the pile-up. This is because the capacitance density of the pn junction in the window structure is higher compared with the pin junction as the optical absorption region, and the application of electric field to the optical absorption region becomes insufficient in a case of receding the electrode structure from the junction between the optical absorption region and the window structure making it difficult to discharge photo-carriers generated in the optical absorption region. An undope waveguide structure comprising a structure having such compositional wavelength and a film thickness that the compositional wavelength for each of multi-layers constituting the waveguide structure is sufficiently shorter than that of the signal light and the average refractive index is about identical with that in the optical absorption region may be disposed. In a case of forming the electrode structure so as to overlap the junction boundary between the optical absorption region and the undope waveguide, and do not extend on the joined boundary between the undope waveguide and the window structure, increase in the parasitic capacitance due to the pn junction of the window structure and pile up can be suppressed simultaneously.
Owner:LUMENTUM JAPAN INC

Multilayer capacitor array

ActiveUS20080158773A1High capacitancePrevent delamination and crosstalk phenomenonMultiple fixed capacitorsFixed capacitor electrodesCapacitanceSingle electrode
A multilayer capacitor array having a plurality of multilayer capacitor devices formed in a single multilayer structure, the multilayer capacitor array including: a capacitor body formed by depositing a plurality of dielectric layers and having first and second side surfaces opposite to each other; a plurality of first polarity internal electrodes and second polarity internal electrodes, disposed oppositely to each other in the capacitor body, interposing the dielectric layer there between, and formed of a single electrode plate comprising a single lead, respectively; and a plurality of first polarity external electrodes and second polarity external electrodes, formed on the first side surface and second side surface, respectively, and connected to a correspondent polarity internal electrode via the lead, the first polarity external electrode formed on the first side surface and the second polarity external electrode formed on the second side surface, wherein the numbers of the first polarity external electrodes and the second polarity external electrodes are two or more, respectively, and are identical to each other, and a total number of the multilayer capacitor devices in the multilayer capacitor array is identical to the number of the first polarity external electrodes.
Owner:SAMSUNG ELECTRO MECHANICS CO LTD
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