Power supply system, power supply method, film forming apparatus, and measuring apparatus

Abstract

The invention provides a power supply system which comprises a light source module, a photoelectric conversion module, a voltage detection module, an automatic tracking module, a signal transmission module and a control module. The voltage detection module is connected with the photoelectric conversion module to detect a voltage signal of the photoelectric conversion module; the control module is in communication connection with the voltage detection module and the automatic tracking module, and is used for controlling the automatic tracking module to automatically adjust the light source module according to the voltage signal. Therefore, the light source module automatically tracks and aligns to the photoelectric conversion module so as to continuously supply energy to the electric equipment. According to the invention, continuous and stable energy supply can be kept for electric equipment which is not suitable for wiring, and the complex installation and design cost is saved. The invention further provides a power supply method, a film forming device and a measuring device.

Description

technical field [0001] The present invention relates to the technical field of energy supply, in particular to a wireless power supply system and a power supply method for semiconductor wafer measurement equipment in a film forming system, and in particular to a power supply system, a power supply method, a film forming device and a measuring device. Background technique [0002] Nowadays, toxic, harmful, flammable, explosive and other gases are generally used in the semiconductor epitaxial growth process. Based on safety considerations, glove boxes are generally required in the film formation system; in addition, in order to optimize process control, film formation Wafer measurement equipment is usually configured in the system to monitor the quality of wafer thin film growth during epitaxial growth in real time. At present, there are generally two ways to install the wafer measurement equipment and the glove box. [0003] figure 1 It is a schematic diagram of installatio...

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Problems solved by technology

However, this installation method has the following problems: (1) The sealing of the cable adapter is complicated and the cost is high; (2) When the cable is located in a glove box with flammable and explosive gases, the cable needs to be subjected to explosion-proof treatment; (3) In some cases In the glove box, the plane on which the wafer measurement equipment is installed needs to be rotated, which will cause distortion and other effects on the cables between the wafer measurement equipment and the cable adapter.

However, since the wafer measurement device 10 is placed on the outer top of the glove box 20 and is too far away from the reaction chamber 21, the optical path from the measurement device to the reaction chamber will be too long, resulting in extremely weak signals and affecting the measurement effect.

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